Sketch schematically the dependence of the electron concentration in the conduction band on the temperature as logn versus 1/T, and mark the various important regions and critical temper
Trang 1Second Edition ( 2001 McGraw-Hill)
Chapter 5
5.1 Bandgap and photodetection
a Determine the maximum value of the energy gap that a semiconductor, used as a photoconductor,
can have if it is to be sensitive to yellow light (600 nm)
b A photodetector whose area is 5 × 10-2 cm2 is irradiated with yellow light whose intensity is 2 mW
cm-2 Assuming that each photon generates one electron-hole pair, calculate the number of pairs generated per second
c From the known energy gap of the semiconductor GaAs (E g = 1.42 eV), calculate the primary wavelength of photons emitted from this crystal as a result of electron-hole recombination
d Is the above wavelength visible?
e Will a silicon photodetector be sensitive to the radiation from a GaAs laser? Why?
Solution
a We are given the wavelength λ = 600 nm, therefore we need Eph = hυ = E g so that,
E g = hc/λ = (6.626 × 10-34 J s)(3.0 × 108 m s-1) / (600 × 10-9 m)
∴ E g = 3.31 × 10 -19 J or 2.07 eV
b Area A = 5 × 10-2 cm2 and light intensity Ilight = 2 × 10-3 W/cm2 The received power is:
P = A Ilight = (5 × 10-2 cm2)(2 × 10-3 W/cm2) = 1.0 × 10-4 W
N ph = number of photons arriving per second = P/E ph
∴ N ph = (1.0 × 10-4 W) / (3.31 × 10-19 J) = 3.02 × 1014 Photons s-1
Since the each photon contributes one electron-hole pair (EHP), the number of EHPs is then:
N EHP = 3.02 × 10 14 EHP s -1
c For GaAs, E g = 1.42 eV and the corresponding wavelength is
λ = hc/Eg = (6.626 × 10-34 J s)(3.0 × 108 m s-1) / (1.42 eV × 1.602 × 10-19 J/eV)
∴ λ = 8.74 × 10 -7 m or 874 nm
The wavelength of emitted radiation due to electron-hole pair (EHP) recombination is therefore
874 nm
d It is not in the visible region (it is in the infrared)
e From Table 5.1 (in the textbook), for Si, E g = 1.10 eV and the corresponding cut-off wavelength
is,
λg = hc/E g = (6.626 × 10-34 J s)(3.0 × 108 m s-1) / (1.1 eV × 1.602 × 10-19 J/eV)
∴ λg = 1.13 × 10 -6 m or 1130 nm
5.1
Trang 2Since the 874 nm wavelength of the GaAs laser is shorter than the cut-off wavelength of 1130
nm, the Si photodetector can detect the 874 nm radiation (Put differently, the photon energy
corresponding to 874 nm, 1.42 eV, is larger than the E g, 1.10 eV, of Si which means that the Si
photodetector can indeed detect the 874 nm radiation)
5.2 Minimum conductivity
a Consider the conductivity of a semiconductor, σ = enµe + epµ h Will doping always increase the conductivity?
b Show that the minimum conductivity for Si is obtained when it is p-type doped such that the hole
concentration is
p m = n i µe
µh and the corresponding minimum conductivity (maximum resistivity) is
σmin = 2en i µeµh
c Calculate p m and σmin for Si and compare with intrinsic values
Solution
a Doping does not always increase the conductivity Suppose that we have an intrinsic sample
with n = p but the hole drift mobility is smaller If we dope the material very slightly with p-type then p
> n However, this would decrease the conductivity because it would create more holes with lower mobility at the expense of electrons with higher mobility Obviously with further doping p increases
sufficiently to result in the conductivity increasing with the extent of doping
b To find the minimum conductivity, first consider the mass action law:
np = n i2 isolate n: n = n i2/p
Now substitute for n in the equation for conductivity:
σ = enµe + epµ h
p +µh ep
To find the value of p that gives minimum conductivity (p m), differentiate the above equation
with respect to p and set it equal to zero:
dσ
= −en i2µe
2 +µh e
2
p m +µh e= 0
Isolate p m and simplify,
Trang 3p m = n i µe
µh Substituting this expression back into the equation for conductivity will give the minimum conductivity:
σmin = en i2µe
p m +µh ep m= en i2µe
n i µe µh +µh en i µe
µh
µe + en i µeµh = en i µeµh + en i µeµh
c From Table 5.1, for Si: µe = 1350 cm2 V-1 s-1, µh = 450 cm2 V-1 s-1 and n i = 1.45 × 1010 cm-3
Substituting into the equations for p m and σmin:
p m = n i µe
µh = 1.45 ×10
10
cm−3
450 cm2 V−1 s−1 = 2.51 × 10 10 cm -3
σmin = 2en i µeµh
C
cm−3 ( ) (1350 cm2 V−1 s−1) (450 cm2 V−1 s−1)
∴ σmin = 3.62 × 10 -6Ω-1 cm -1
The corresponding maximum resistivity is:
ρmax = 1 / σmin = 2.76 × 10 5 Ω cm
The intrinsic value corresponding to p m is simply n i (= 1.45 × 1010 cm-3) Comparing it to p m:
p m
n i = 2.51×1010 cm−3 1.45×1010 cm−3 =1.73 The intrinsic conductivity is:
σint = en i(µe + µh)
∴ σint = (1.602 × 10-19 C)(1.45 × 1010 cm-3)(1350 cm2 V-1 s-1 + 450 cm2 V-1 s-1)
∴ σint = 4.18 × 10-6 Ω-1 cm-1
Comparing this value to the minimum conductivity:
σint
σmin =
3.62×10−6 W−1 cm−1 4.18×10−6 W-1 cm-1 = 0.866 Sufficient p-type doping that increases the hole concentration by 73% decreases the conductivity
by 15% to its minimum value
5.3 Compensation doping in Si
a A Si wafer has been doped n-type with 1017 As atoms cm-3
1 Calculate the conductivity of the sample at 27 °C
5.3
Trang 42 Where is the Fermi level in this sample at 27 °C with respect to the Fermi level (EFi) in intrinsic Si?
3 Calculate the conductivity of the sample at 127 °C
b The above n-type Si sample is further doped with 9 × 1016 boron atoms (p-type dopant) per
centimeter cubed
1 Calculate the conductivity of the sample at 27 °C
2 Where is the Fermi level in this sample with respect to the Fermi level in the sample in (a) at 27
°C? Is this an n-type or p-type Si?
Solution
a Given temperature T = 27 °C = 300 K, concentration of donors Nd = 1017 cm-3, and drift mobility
µe ≈ 800 cm2 V-1 s-1 (from Figure 5Q3-1) At room temperature the electron concentration n = N d >> p
(hole concentration)
50 100
1000 2000
-3
Electrons Holes
Dopant Concentration, cm
Figure 5Q3-1 The variation of the drift mobility with dopant concentration in Si
for electrons and holes at 300 K
(1) The conductivity of the sample is:
σ = eNdµe ≈ (1.602 × 10-19 C)(1017 cm-3)(800 cm2 V-1 s-1) = 12.8 Ω -1 cm -1
(2) In intrinsic Si, E F = E Fi,
In doped Si, n = N d , E F = E Fn,
Eqn (2) divided by Eqn (1) gives,
N d
= exp E Fn − E Fi
n i
= E Fn − E Fi
Trang 5∴ ∆E F = E Fn − E Fi = kT ln(N d /n i) (4)
Substituting we find (n i = 1.45 × 1010 cm-3 from Table 5.1 in the textbook),
∆E F = (8.617 × 10-5 eV/K)(300 K)ln[(1017 cm-3)/ (1.45 × 1010 cm-3)]
∴ ∆E F = 0.407 eV above E fi
10 100 1000 10000 50000
Ge
N d =10 13
Si
µL ∝T–1.5
N d =10 14
N d =10 16
N d =10 17
N d =10 18
N d =10 19
µΙ∝T1.5
Temperature (K)
Figure 5Q3-2 Log-log plot for drift mobility versus temperature for n-type Ge
and n-type Si samples Various donor concentrations for Si are shown, N d are in
cm-3 The upper right insert is the simple theory for lattice limited mobility
whereas the lower left inset is the simple theory for impurity scattering limited
mobility
(3) At T i = 127 °C = 400 K, µe ≈ 450 cm2 V-1 s-1 (from Figure 5Q3-2) The semiconductor is still n-type (check that N d >> n i at 400 K), then
σ = eNdµe ≈ (1.602 × 10-19 C)(1017 cm-3)(450 cm2 V-1 s-1) = 7.21 Ω -1 cm -1
b The sample is further doped with N a = 9 × 1016 cm-3 = 0.9 × 1017 cm-3 acceptors Due to
compensation, the net effect is still an n-type semiconductor but with an electron concentration given
by,
n = N d − N a = 1017 cm-3 − 0.9 × 1017 cm-3 = 1 × 1016 cm-3 (>> n i)
We note that the electron scattering now occurs from N a + N d (1.9 × 1017 cm-3) number of
ionized centers so that µe ≈ 700 cm2 V-1 s-1 (Figure 5Q3-1)
(1) σ = eNdµe ≈ (1.602 × 10-19 C)(1016 cm-3)(700 cm2 V-1 s-1) = 1.12 Ω -1 cm -1
(2) Using Eqn (3) with n = N d − N a we have
N d − N a
n i = exp E Fn′ − E Fi
kT
so that ∆E′Φ = E Fn ′ − E Fi = (0.02586 eV)ln[(1016 cm-3) / (1.45 × 1010 cm-3)]
∴ ∆E′Φ = 0.348 eV above E Fi
The Fermi level from (a) and (b) has shifted “down” by an amount 0.059 eV. Since the
energy is still above the Fermi level, this an n-type Si
5.5
Trang 65.4 Temperature dependence of conductivity
An n-type Si sample has been doped with 1015 phosphorus atoms cm-3 The donor energy level for P
in Si is 0.045 eV below the conduction band edge energy
a Calculate the room temperature conductivity of the sample
b Estimate the temperature above which the sample behaves as if intrinsic
c Estimate to within 20% the lowest temperature above which all the donors are ionized
d Sketch schematically the dependence of the electron concentration in the conduction band on the
temperature as log(n) versus 1/T, and mark the various important regions and critical temperatures
For each region draw an energy band diagram that clearly shows from where the electrons are excited into the conduction band
e Sketch schematically the dependence of the conductivity on the temperature as log(σ) versus 1/T and mark the various critical temperatures and other relevant information
Solution
Si Ge
GaAs
0°C 200°C
400°C
10 18
10 15
10 12
10 3
10 6
2.4×10 13 cm -3
2.1×10 6 cm -3
1000/T (1/K)
Figure 5Q4-1 The temperature dependence of the intrinsic concentration
a The conductivity at room temperature T = 300 K is (µ e = 1350 × 10-4 m2 V-1 s-1 can be found in Table 5.1 in the textbook):
σ = eNdµe
∴ σ = (1.602 × 10-19 C)(1 × 1021 m-3)(1350 × 10-4 m2 V-1 s-1) = 21.6 Ω -1 m -1
b At T = T i , the intrinsic concentration n i = N d = 1 × 1015 cm-3 From Figure 5Q4-1, the graph of
n i (T) vs 1/T, we have:
Trang 71000 / T i = 1.9 K-1
c The ionization region ends at T = T s when all donors have been ionized, i.e when n = N d From
Example 5.7, at T = T s:
n = N d = 1
2N c N d
1 2
2kT s
2k ln N d
1
2N c N d
2k ln 2N d
N c
k ln N c 2N d
Take N c = 2.8 × 1019 cm-3 at 300 K from Table 5.1 (in the textbook), and the difference between the donor energy level and the conduction band energy is ∆E = 0.045 eV Therefore our first
approximation to T s is:
T s = ∆E
k ln N c 2N d
=
0.045 eV
1.381×10−23 J/K ( )ln (2.8×1019 cm−3)
2 10( 15 cm−3)
= 54.68 K
Find the new N c at this temperature, N c′:
′
N c = N c T s
300
3 2
= 2.8 × 1019
cm−3
300 K
3 2
= 2.179 × 1018 cm-3
Find a better approximation for T s by using this new N c′:
T s′ = ∆E
k ln N c′
2N d
=
0.045 eV
1.381×10−23 J/K
2 10( 15 cm−3)
= 74.64 K
∴ N c′ ′ = N c T s′
300
3 2
= 2.8 × 10( 19 cm−3) 74.64 K300 K
3 2
= 3.475 × 1018 cm-3
A better approximation to T s is:
T s′ ′ = ∆E
k ln N c′ ′
2N
=
0.045 eV
1.381×10−23 J/K
2 10( 15 cm−3)
= 69.97 K
d
∴ N c′ ′ ′ = N c T s′ ′
300
32
= 2.8 × 10( 19 cm−3) 69.97 K300 K
3 2 = 3.154 × 1018 cm-3
5.7
Trang 8∴ T s′ ′ ′ = ∆E
k ln N c′ ′ ′
2N d
=
0.045 eV
1.381×10−23 J/K
2 10( 15 cm−3)
= 70.89 K
We can see that the change in T s is very small, and for all practical purposes we can consider the
calculation as converged Therefore T s = 70.9 K = −202.1 °C
d and e See Figures 5Q4-2 and 5Q4-3
ln(n)
1/T
T i
T s
Intrinsic
n i (T)
slope = –E g /2k
Figure 5Q4-2 The temperature dependence of the electron concentration in an n-type semiconductor
log(n)
INTRINSIC
EXTRINSIC
IONIZATION log( σ )
log( µ ) µ∝T –3/2 µ∝T 3/2
Lattice scattering
Impurity scattering
1/T
Low Temperature High Temperature
T
Metal Semiconductor
Figure 5Q4-3 Schematic illustration of the temperature dependence of electrical
conductivity for a doped (n-type) semiconductor
5.5 GaAs
Ga has a valency of III and As has V When Ga and As atoms are brought together to form the GaAs crystal, as depicted in Figure 5Q5-1, the 3 valence electrons in each Ga and the 5 valence electrons in each As are all shared to form four covalent bonds per atom In the GaAs crystal with some 1023 or so equal numbers of Ga and As atoms, we have an average of four valence electrons per atom, whether
Ga or As, so we would expect the bonding to be similar to that in the Si crystal: four bonds per atom The crystal structure, however, is not that of diamond but rather that of zinc blende (Chapter 1 of the textbook)
Trang 9a What is the average number of valence electrons per atom for a pair of Ga and As atoms and in the
GaAs crystal?
b What will happen if Se or Te, from Group VI, are substituted for an As atom in the GaAs crystal?
c What will happen if Zn or Cd, from Group II, are substituted for a Ga atom in the GaAs crystal?
d What will happen if Si, from Group IV, is substituted for an As atom in the GaAs crystal?
e What will happen if Si, from Group IV, is substituted for a Ga atom in the GaAs crystal? What do
you think amphoteric dopant means?
f Based on the above discussion ,what do you think the crystal structures of the III-V compound
semiconductors AlAs, GaP, InAs, InP, and InSb will be?
As Ga
As Ga As Ga
As Ga
As Ga As Ga
As Ga
Ga atom (Valency III) As atom (Valency V)
Figure 5Q5-1 The GaAs crystal structure in two dimensions Average number
of valence electrons per atom is four Each Ga atom covalently bonds with
four neighboring As atoms and vice versa
Solution
Ga atom (Valency III)
As atom (Valency V)
ψhyb orbitals
As ion core (+5e)
Valence
electron
ψhyb orbitals
Ga ion core (+3e)
Valence electron
Explanation of bonding in GaAs: The one s and three p orbitals hybridize to form 4 ψ hyb
orbitals In As there are 5 valence electrons One ψhyb has two paired electrons and 3 ψhyb have 1
electron each as shown In Ga there are 3 electrons so one ψhyb is empty This empty ψhyb of Ga can overlap the full ψhyb of As The overlapped orbital, the bonding orbital, then has two paired electrons This is a bond between Ga and As even though the electrons come from As (this type of bonding is
called dative bonding) It is a bond because the electrons in the overlapped orbital are shared by both
As and Ga The other 3 ψhyb of As can overlap 3 ψhyb of neighboring Ga to form "normal bonds"
5.9
Trang 10Repeating this in three dimensions generates the GaAs crystal where each atom bonds to four
neighboring atoms as shown Because all the bonding orbitals are full, the valence band formed from these orbitals is also full The crystal structure is reminiscent of that of Si GaAs is a semiconductor
a The average number of valence electrons is 4 electrons per atom
b Se or Te replacing As will have one additional electron that cannot be involved in any of the four bonds Hence Se and Te will act as a donor
c Zn or Cd replacing Ga will have one less electron than the substituted Ga atom This creates a hole in a bond Zn and Cd will act as acceptors
d The Si atom has 1 less electron than the As atom and when it substitutes for an As atom in GaAs there is a "hole" in one of the four bonds This creates a hole, or the Si atom acts as an acceptor
e The Si atom has 1 more electron than the Ga atom and when it substitutes for a Ga atom in GaAs there is an additional electron that cannot enter any of the four bonds and is therefore donated into the
CB (given sufficiently large temperature) Si substituting for Ga therefore acts as a donor
f All these compounds (AlAs, GaP, InAs, InP, InSb) are compounds of III elements and V
elements so they will follow the example of GaAs