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Design and Implementation of VLSI Systems_Lecture 04: Mos transistor Theory pdf

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Tiêu đề MOS Transistor Theory
Người hướng dẫn Thuan Nguyen
Trường học University of Science, VNU HCMUS
Chuyên ngành VLSI Systems
Thể loại lecture
Năm xuất bản Spring 2011
Thành phố Ho Chi Minh City
Định dạng
Số trang 58
Dung lượng 1,52 MB

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CURRENT-VOLTAGE RELATIONS As L increases, Vds diminishes in effect more voltage drop  takes longer to push carriers across the transistor  reducing current flow... TRANSISTOR CAPACITA

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Design and Implementation of

VLSI Systems Lecture 04

Thuan Nguyen Faculty of Electronics and Telecommunications,

University of Science, VNU HCMUS

Spring 2011

1

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LECTURE 04: MOS TRANSISTOR THEORY

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LECTURE 04: MOS TRANSISTOR THEORY

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I DEAL (S HOCKLEY ) M ODEL

4

Review: p-n junction

Trang 5

 A p–n junction in thermal equilibrium

Trang 6

 A p–n junction in thermal

equilibrium with zero bias voltage applied Under the junction, plots for the charge density, the electric field

and the voltage are reported

6

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GATE-OXIDE-BODY SANDWICH = CAPACITOR

Vg < 0

(b)

+ -

0 < Vg < Vt

depletion region

(c)

+ -

Vg > Vt

depletion region inversion region

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NMOS CUTOFF

 No channel

 Ids ≈ 0

+ -

Vgs = 0

+ -

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Vgs > Vt

+ -

Vgd = Vgs

+ -

Vgs > Vt

+ -

Vgs > Vgd > Vt

Vds = 0

0 < Vds < Vgs-Vtp-type body

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NMOS SATURATION

 Channel pinches off

 Ids independent of Vds

We say current saturates

 Similar to current source

+ -

Vgs > Vt

+ -

Vgd < Vt

Vds > Vgs-Vtp-type body

b

g

10

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THE MOS TRANSISTOR HAS THREE REGIONS

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HOW TO CALCULATE THE CURRENT VALUE?

 MOS structure looks like parallel plate

capacitor while operating in inversion

 Gate – oxide – channel

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CARRIER VELOCITY IS A FACTOR IN

 Charge is carried by electrons

Carrier velocity v proportional to lateral

E-field between source and drain

v = μE μ called mobility

 E = Vds/L

 Time for carrier to cross channel:

t = L / v

13

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I=Q/ T

 Now we know

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IN LINEAR MODE (VGS > VT & VDS < VGS-VT)

Can be ignored for small Vds

 For a given V gs , I ds is proportional (linear) to V ds

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IN SATURATION MODE (VGS > VT AND VDS

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OPERATION MODES SUMMARY

 2

cutoff linear saturatio

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CURRENT-VOLTAGE RELATIONS

 As L increases, Vds diminishes in effect (more

voltage drop)  takes longer to push carriers

across the transistor  reducing current flow

18

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TRANSISTOR CAPACITANCE

19

 Gate capacitance: to body + to drain + to source

 Diffusion capacitance: source-body and drain-body

capacitances

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GATE CAPACITANCE AS A FUNCTION OF VGS

20

QuickTime™ and a decompressor are needed to see this picture.

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SOURCE/DRAIN DIFFUSION CAPACITANCE

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SUMMARY OF SHOCKLEY MODEL

22

cutoff linear saturatio

Covered ideal (long channel) operation (Shockley model) of transistor

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LECTURE 04: MOS TRANSISTOR THEORY

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IDEAL VS NON-IDEAL

24

 Saturation current does not increase quadratically with Vgs

 Saturation current lightly increases with increase in Vds

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25

 There is leakage current when the transistor is in cut off

 Ids depends on the temperature

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At high electric field, drift velocity rolls

of due to carrier scattering

Empirically:

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ALPHA MODEL

27

linear saturation

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MOBILITY DEGRADATION

28

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C HANNEL LENGTH MODULATION

29

• The reverse-bias p-n junction between drain

and body forms a depletion region with a width

L d that increases with V db

• Increasing Vds

 increases depletion width

 decreases effective channel length

 increases current

Channel length modulation factor (empirical factor)

n + p

Gate

bulk Si

n +

V DD

GND

L Leff

Depletion Region Width: L d

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L EAKAGE CURRENT : SUBTHRESHOLD

Subthreshold conduction

Tunnel current

Junction leakage

 Subthreshold leakage is

the biggest source in

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LEAKAGE CURRENT: JUNCTION LEAKAGE AND TUNNELING

31

D T

V v

D S

   

Junction leakage: reverse-biased p-n junctions

have some leakage

Is depends on doping levels and area and

perimeter of diffusion regions

Tunneling leakage:

 Carriers may tunnel thorough very thin gate oxides

 Negligible for older processes

(and future processes with high-k dielectrics!)

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I MPACT OF TEMPERATURE

32

o Carrier mobility decreases with T o ↑

o Threshold voltage decreases nearly linearly with T o ↑

o Junction leakage increases with T o ↑

o ON current decreases and OFF current increases with T o ↑

 Circuit performance is generally worst at high T o ↑

 negative temperature coefficient

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I MPACT OF TEMPERATURE ( CONT )

33

Circuit performance can be improved by cooling

o Subthreshold leakage decreases with T o ↓

o Velocity saturation increases with T o ↓  more current

o Mobility increases with T o ↓  save power

o Depletion regions become wider with T o ↓  less junction

capacitance

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 

si ox

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PROCESS VARIATIONS

35

Both MOSFETs have 30nm channel with 130 dopant atoms in the channel depletion region

Process variations impact gate length, threshold

voltage, and oxide thickness

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SUMMARY OF TRANSISTOR OPERATION

36

NMOS transistor PMOS transistor

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 Homework Assignment #3 View

 Submit your answer in the next week

38

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LECTURE 04: MOS TRANSISTOR THEORY

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 In between, Vout depends on

transistor size and current

 By KCL, must settle such that

Idsn = |Idsp|

 We could solve equations

 But graphical solution gives more insight

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TRANSISTOR OPERATION

 Current depends on region of transistor behavior

 For what Vin and Vout are nMOS and pMOS in

 Cutoff?

 Linear?

 Saturation?

41

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LOAD LINE ANALYSIS

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BETA RATIO

 If p / n  1, switching point will move from

VDD/2

Called skewed gate

 Other gates: collapse into equivalent inverter

10

p n

0.1

p n

50

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NOISE MARGINS

 How much noise can a gate input see before it

does not recognize the input?

Indeterminate Region

NML

NMH

Input Characteristics Output Characteristics

Logical Low Input Range

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 To maximize noise margins, select logic levels at

 unity gain point of DC transfer characteristic

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TRANSIENT RESPONSE

DC analysis tells us Vout if Vin is constant

Transient analysis tells us Vout(t) if Vin(t) changes

 Requires solving differential equations

 Input is usually considered to be a step or ramp

 From 0 to VDD or vice versa

53

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 Hence transistor would turn itself off

 nMOS pass transistors pull no higher than VDD

-Vtn

 Called a degraded “1”

 Approach degraded value slowly (low Ids)

 pMOS pass transistors pull no lower than Vtp

 Transmission gates are needed to pass both 0

and 1

54

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PASS TRANSISTOR DC CHARACTERISTICS

56

As the source can rise to within a threshold voltage of the

gate, the output of several transistors in series is no more

degraded than that of a single transistor

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 Homework Assignment #4 View

 Submit your answer in the next week

57

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Q & A

58

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