Spin-coated thin films of SiO2– WO3 composites for detection ofXusheng Wang, Go Sakai, Kengo Shimanoe, Norio Miura, Noboru Yamazoe * Department of Materials Science and Technology, Gradu
Trang 1Spin-coated thin films of SiO2– WO3 composites for detection of
Xusheng Wang, Go Sakai, Kengo Shimanoe, Norio Miura, Noboru Yamazoe *
Department of Materials Science and Technology, Graduate School of Engineering Sciences, Kyushu Uni 6ersity, Kasuga-shi, Fukuoka816, Japan
Received 21 May 1997; received in revised form 18 August 1997; accepted 20 August 1997
Abstract
Thin films of SiO2– WO3composites with various SiO2contents (0 – 20 wt%) were prepared by means of sol-gel method The grain size of WO3 decreased with increasing SiO2 content, resulting in an increase in NO2 sensitivity On the other hand, the response transient to NO2was brought to be the quickest at 5% SiO2 The thin film of SiO2(5%) – WO3was far more sensitive
to NO2than the thin film or sintered block of pure WO3 It could detect dilute NO2(0.1 – 2 ppm) in air at 350°C sensitively and fairly selectively The NO2sensing characteristics were stable over the whole test period of 10 days © 1997 Elsevier Science S.A
Keywords: Sol-gel; Thin films; NO2sensor; WO3; SiO2; AFM
1 Introduction
From an environmental concern, there has been an
increasing demand for sensory detection of nitrogen
oxides (NOx: NO and NO2), which are typical air
pollutants released from combustion facilities and
auto-mobiles Especially NO2 is highly toxic to human
nerves and respiratory organs so that high-sensitivity
detection of it is desired for air quality monitoring
Various solid-state sensors to detect NO2 and/or NO
have been proposed by using semiconducting oxides
[1 – 4], solid electrolytes [1,5] and SAW devices [6]
However, the detection of NO2 in the vicinity of
envi-ronmental standard (40 – 60 ppb in Japan) has remained
to be a challenge Recently, semiconductor sensors
using WO3 have been proved to be very sensitive to
NO2[2,3,7 – 10] The NO2sensitivity has been shown to
be improved by using fine particles of WO3 [3] or thin
films of WO3 prepared by vacuum evaporation [8], RF
sputtering [9], or sol-gel methods [10,12] These reports
suggest that further improvements in NO2 sensitivity
may be possible by controlling the microstructure of
WO3 Compared with the other techniques, sol-gel
methods allow one to control relatively easily the
parti-cle size and dispersion of components in composite
films, as illustrated for silica thin films [11] In this paper we examined the NO2sensing properties of SiO2 -mixed WO3 composite thin films prepared by a sol-gel method
2 Experimental
Thin films were fabricated on an alumina substrate (unpolished, 9 × 13 mm2) with comb-shaped gold elec-trodes (area 9 × 9 mm2) by a spin-coating technique Coating solutions were prepared as follows Te-traethoxysilane was mixed with ethanol and water (1:4:4 in molar ratio), together with a trace amount of HCl catalyst, and stirred for 30 min This solution (transparent) was further mixed with an aqueous solu-tion (2.5 wt%) of ammonium paratungstate ((NH4)10W12O41· 5H2O) to designated proportions A small amount of each coating solution thus obtained was dropped on the substrate, allowed to spread over
by spinning (1500 rpm, 20 s) and dried at 350°C for 10 min The same procedures were repeated 15 times to increase the film thickness up to about 0.8 mm, before firing was carried out at 550°C for 1 h The SiO2 content was set to 0, 5, 10 or 20 wt% to WO3 and is denoted like SiO2(5%) – WO3 hereafter
Thin films were characterized by means of XRD analysis (Riguku 4011) and AFM observation
* Corresponding author Tel.: + 81 92 5837539 fax: + 81 92
5752318.
0925-4005/97/$17.00 © 1997 Elsevier Science S.A All rights reserved.
PII S 0 9 2 5 - 4 0 0 5 ( 9 7 ) 0 0 2 8 6 - 4
Trang 2(Nanoscope IIIa; Digital Instruments Inc.) Sensing
characteristics were measured in a conventional flow
apparatus (gas flow rate 100 cm3min− 1) in the
temper-ature range of 250 – 450°C Gas sensitivity (S) was
defined as Rg/Ra, where Ra and Rg are the electrical
resistances in air and in the sample gas, respectively
3 Results and discussion
3.1 Microstructure
Fig 1 shows the XRD patterns of a series of SiO2–
WO3films prepared, together with that of the uncoated
substrate The XRD peaks other than those of Al2O3
(substrate) and Au (electrode) were all assigned to a
monoclinic phase of WO3 (JCPDS 43-1035), the
inten-sity pattern being very similar to that of the WO3
powder obtained from ammonium paratungstate by
pyrolysis It was also obvious that the SiO2 component
included was amorphous The XRD peaks of WO3
tended to become broader with increasing SiO2content
The average grain size of WO3was estimated from the
full width at half maximum of the strongest peak (200)
at 2u=24.2° based on Sherrer’s equation As shown in
Fig 2, the grain size decreased with an increase in SiO2
content, indicating that the growth of WO3 grains was
suppressed by SiO2
Fig 2 Average grain size of WO3evaluated from XRD as a function
of SiO2content.
Fig 3 shows AFM images of the thin films The bright spots, corresponding to the grains of WO3, were
50 – 100 and 30 – 50 nm in diameter for WO3 (a) and SiO2 (20%) – WO3 (b), respectively These values are in fair agreement with those obtained from the XRD peak above, if one considers the tip size (15 nm in diameter)
of AFM probe
3.2 NO2 sensing characteristics
The electrical resistance of each film in air (Ra) and in 0.4 ppm NO2-containing air (Rg) as well as the resulting sensitivity to 0.4 ppm NO2 are shown as a function of
temperature in Fig 4 As already reported [7 – 10], Rg was always larger than Ra, indicating anionic adsorp-tion of NO2on the surface of WO3(n-type oxide) At a
fixed temperature, both Ra and Rg tended to increase with an increase in SiO2content except that SiO2(5%) –
WO3had larger Ra and Rgvalues than WO3 However,
Rgwas more dependent on SiO2content than Ra, giving
Fig 1 XRD patterns of WO3, WO3+ 5wt% SiO 2 , WO3+
10wt% SiO2and WO3+ 20wt% SiO 2 thin films deposited on alumina
substrates with Au electrodes Fig 3 AFM images of thin films (a): WO , (b): SiO (20%) – WO
Trang 3Fig 4 NO2sensing properties of SiO2– WO3thin films as a function
of temperature SiO2content: 0% (1), 5% (2), 10% (3), 20% (4) (a):
Resistance in air (Ra) or 0.4 ppm NO2 containing air (Rg); (b):
sensitivity to 0.4 ppm NO2in air.
seen to consist of two steps, although such steps be-came less visible at 0.2 and 0.4 ppm NO2 and totally disappeared at 0.8 ppm and above The same two-step behavior at low NO2concentrations was also observed with the other films, and is considered to appear from the coexistence of strong and weak adsorption of NO2
as described shortly
The correlations between normalized resistances (Ra/
Rg) and NO2concentrations for the films of pure WO3 and SiO2(5%) – WO3 at 350°C are shown in Fig 6
Rg/Ra was almost linear to the NO2 concentration and the slope of SiO2(5%) – WO3was almost twice as steep
as that of WO3, indicating the higher sensitivity of the
former film Since Rg/Ra should be unity at zero con-centration of NO2, the correlations should have a sharp inflection in the low concentration range as schemati-cally illustrated by a dotted line Qualitatively speaking, such an inflection can be accounted for by assuming two types of NO2 adsorption, i.e one type which is strong in bonding but small in capacity and the other which is weak but large in capacity It is considered that the saturation of the first type adsorption at a low concentration of NO2 gives rise to the inflection men-tioned above It follows that these two types differ in adsorption kinetics, giving rise to the two-step response transients at lower NO2 concentrations Correspond-ingly the replots of the same data in a log-log scale (Fig 7) gave the correlations, the slopes of which were close to unity in the higher NO2 concentration range and decreased with decreasing NO2 concentration For comparison, the data of the sintered block type element
of WO3 measured at 300°C are also indicated in the same figure Roughly speaking, the sensitivity decreases
to about 1/2 with a rise of temperature by 50°C Taking this into account, the present thin film of SiO2(5%) –
WO3 is estimated to have higher sensitivity than the sintered block of WO3 by more than one order of magnitude
3.3 Selecti 6ity and stability
A practical NO2sensor should be resistant enough to interferences by coexistence gases Thus the sensing properties of SiO2(5%) – WO3 to 0.4 ppm NO2 in air were examined under the coexistence of 100 ppm CO,
100 ppm CO2, or 5000 ppm H2O at 350°C Fig 8 shows
the influence of these gases on Ra and Rg These gases
tended to reduce Ra slightly or significantly (H2O),
while such tendencies were less pronounced for Rg
values As seen from Fig 8, the NO2sensing properties were fairly stable to the coexistence of CO and CO2 However, the interference by water vapor was signifi-cant, needing further investigations to overcome it
To examine the stability of NO2 sensing perfor-mance, the SiO2(5%) – WO3 film was exposed repeat-edly to 0.4 ppm NO at a frequency of three times a
rise to an increase in sensitivity (S) at a fixed
tempera-ture With lowering temperature, Rg increased more
steeply than Ra, leading to a rather sharp increase in S.
As seen from Fig 4, S tails off at about 500°C when
temperature is increased On the other hand, lowering
temperature resulted in a sharp loss in the rates of
response and recovery As a trade-off between the
sensitivity and the response kinetics, an operating
tem-perature of 350°C was selected in the subsequent study
Table 1 summarizes some sensing characteristics of
the composite films to 0.4 ppm NO2 in air at 350°C
The sensitivity (S) tended to increase gradually with
increasing SiO2content The times of 90% response and
90% recovery were rather large in all cases, being 5 – 7
and 7 – 15 min, respectively Nevertheless SiO2(5%) –
WO3showed the shortest recovery time of 7 min From
this feature as well as the rather high sensitivity, this
film was selected for further investigations of NO2
sensing properties
Fig 5 shows the response and recovery transients of
SiO2(5%) – WO3 film on switching on and off various
concentrations of NO2 in air between 0.1 and 2.0 ppm
at 350°C The response transient to 0.1 ppm NO is
Trang 4Table 1
Sensing characteristics of SiO 2 – WO 3 thin films at 350°C
90% Recovery time (min)
Resistance (Ra , V) Sensitivity a(Ra/Rg ) 90% Response time (min) Film
SiO2(5%) – WO3 3.2×10 5 8.1
1.9×10 6
SiO2(20%) – WO3
a To 0.4 ppm NO2in air.
day for 10 days As shown in Fig 9, both Rg and Ra
were fairly stable over the whole test period This
confirms that the film is stable enough at least for a
short term
3.4 Imprecation of SiO2– WO3 composite films
In the present preparation conditions of SiO2– WO3
composite films, SiO2 was deposited through a sol-gel
process [3] On the other hand, it was confirmed by
XRD analysis that WO3took form through the
crystal-lization of WO3· 0.33H2O from the solution followed
by its dehydration It is considered that the dispersion
of fine particles of SiO2 hinders the grain growth of
WO3· 0.33H2O or WO3, leading to a decrease in WO3
grain size with increasing SiO2 content (Fig 2) It is
rather striking that the decreasing behavior of grain size
is exactly reflected by the sensitivity behavior of the
films (Table 1) This means that the sensitivity to NO2
is primarily determined by the grain size of WO3 in agreement with literature [3] The higher sensitivity of the SiO2– WO3 films than that of the WO3 sintered block previously reported [2] by about one order of magnitude or more may also be ascribable primarily to
a difference in grain size Apart from the grain size of
WO3, the dispersion of SiO2 would also change the microstructure of the film, e.g porosity and pore size distribution which affects the rate of response In this respect, the SiO2(5%) – WO3 film showing the shortest response and recovery times appears to have the mi-crostructure most porous for NO2molecules to diffuse inside and outside However, the response kinetics were not quick enough even with this film The microstruc-ture would depend not only on the SiO2 content but also on many other factors, e.g SiO2 particle size, agglomeration state and film thickness, which are all related with the methods and conditions of film prepa-ration Further studies to optimize the microstructure from these viewpoints would be necessary
As mentioned above, incorporation of SiO2 in the
WO3 sensing film to form SiO2– WO3 composite was fairly effective in suppressing the grain growth of WO3 and in enhancing the porous structure These effects have lead to higher sensitivity and quicker response,
Fig 5 Response transients of SiO2(5%) – WO3thin film on turning
on and off various concentrations of NO diluted in air.
Fig 6 Normalized resistance of thin films under exposure to various concentrations of NO in air (350°C).
Trang 5Fig 7 Normalized resistance vs concentration correlations in a
log – log scale for WO3-based thin films (350°C) and sintered block
(300°C).
Fig 9 Short-term stability of electrical resistance of SiO 2 (5%) – WO 3
film sensor in air and in 0.4 ppm NO 2 at 350°C.
Acknowledgements
This work was partially supported by a Grant-in-Aid for Scientific Research from The Ministry of Ed-ucation, Science, Sports and Culture of Japan, and a grant from Steel Industry Foundation for the Ad-vancement of Environmental Protection Technology
References
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respectively Although the NO2 sensing performance
achieved here are not good enough, still it is expected
that environmental monitoring of NO2 (standard 40
ppb) would be possible by elaborating such composite
films further
4 Conclusions
The preparation of SiO2– WO3 thin films by a
sol-gel method was useful for enhancing the NO2 sensing
characteristics The grain growth of WO3 was
sup-pressed more intensively with increasing SiO2 content,
whereas the film microstructure was brought to be
most easily accessible by NO2 molecules at 5wt%
SiO2 The SiO2(5%) – WO3 film showed fairly good
sensing performances to NO2 in air in the range of
0.1 – 2 ppm
Fig 8 Influences of coexistent CO2, CO or H2O on the resistance of
SiO2(5%) – WO3film in air (Ra) and in 0.4 ppm NO2-containing air
(R) at 300°C.
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control of porous silica, Sensors and Actuators B 24/25 (1995)
347 – 352.
[12] L Armelao, R bertoncello, G Granozzi, G Depaoli, E
Ton-dello, G Battaglin, High purity WO3sol-gel coatings: synthesis
and characterization, J Mater Chem 4 (1994) 407 – 411.
Biographies
Xusheng Wang has been an associate professor at
Xidian University of China since 1993 He received the
MSc degree in 1985 from the university He has been
with Xian Jiaotong University since 1994 Now he is
with Kyushu University as a visiting researcher His
current research interests the ferroelectric and
semicon-ducting functional materials and devices
Go Sakai has been a research associate at Kyushu
University since 1996 He received the BEng degree in
Applied Chemistry in 1991 and a DEng degree in 1996
from Kyushu University His current research works is
focused on the development of chemical sensor based
on semiconductive oxides
Kengo Shimanoe has been a research associate at
Kyushu University since 1995 He received the BEng
degree in Applied Chemistry in 1983 and MEng degree
in 1985 from Kagoshima University and Kyushu Uni-versity, respectively He joined the advanced material and technology laboratory of Nippon Steel Corp and has studied the electronic characterization on semicon-ductor surface and the electrochemical reaction on ma-terials He received a DEng degree in 1993 from Kyushu University His current research interests in-clude the development of chemical sensors and ECD as well as the analysis of solid surface
Norio Miura has been an Associate Professor at
Kyushu University since 1982 He received the BEng degree in Applied Chemistry in 1973, MEng degree in
1975 from Hiroshima University and the DEng degree
in 1980 from Kyushu University His current research concentrates on development of new chemical sensors
as well as other electrochemical functional devices such
as ECD and secondary batteries
Noboru Yamazoe has been a professor at Kyushu
University since 1981 He received the BEng degree in Applied Chemistry in 1963 and a DEng degree in 1969 from Kyushu University His current research interests include the development and application of functional inorganic materials