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Influence of annealing condition on the structure and magnetic properties of NdFeb thin firm

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M agnetic properties of NdFeB film s have been investigated by vib ratio n sam ple m agnetom eter.[r]

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IN F L U E N C E O F A N N EA LIN G C O N D ITIO N ON T H E S T R U C T U R E AND M A G N ETIC P R O P E R T IE S O F NdFeB T H IN F IL M S

L u u T u a n T a i 1,2, T h a n D uc H i e n 1, T a V an K h o a 1, L e T u a n T ù '

' International T raining Institute for M aterials Science (ITIM S)- H U T

1 D epartm ent o f Physics, College o f Science, V N U

A b s tra c t: In flu e n ce o f a n n e a lin g con ditio n on th e s tru c tu re a n d m ag ne tic sho w n th a t N d F e B film s, w h ich w e re pre pa re d at coo ling su b s tra te (T s = 30°C),

7 0 0 °c fo r 2 0 m in in A r g a s w ith d iffe re n t rate o f te m p e ra tu re (3 0 0 °c /m in an d

s tru c tu re an d m a g n e tic p ro p e rtie s o f th e film s w ith h ig h e r ra te o f a n ne alin g

pro p e rtie s o f th e film s h a v e b e en ob serve d

1 I n t r o d u c t i o n

Application of h ard m agnetic film s in M icroElectroM echnical System (MEMS) has been stu d ie d recently T hese devices are prepared from relatively thick film s (1 * 5jim) and high energy product of the ra re e a rth m agnets prom ises sm aller device size The largest

m a rk e t lb)- h ard m agnetic film is in th e m agnetic d ata storage on com puter h ard disk In

o rder to exceed densities of 100Gbit/iir, m aterials with a h ig h er unaxial m agnetic anisotropy fire in tere ste d The high perpendicular m agnetic anisotropy of Nd,Fe,.,B thin films ((4.6 10"erg/cma) pre sen ts th e additional possibility of park in g b its closer together using perpendicular recording [1,2]

There a re m any technical p aram eters (for exam ple elem ental com ponents,

s p u tte re d power, s u b s tra te tem p eratu re, annealing condition .) strongly influence on the

s tru c tu re and m agnetic properties of NdFeB thin films In th is paper, influence of

a n n e alin g condition w as studied

2 E x p e r i m e n t

N dFeB films w ere sp u tte re d onto Si (100, 111) wafer a t nom inal room tem perature The s p u tte r gas p re ssu re w as 5 10:! m bar for all layers in th e film stru ctu re A 20 nm Mo buffer layer an d protective layer w ere used for all NdFeB th in films A ta rg e t was ingot

N dF eB alloy with composition of N dwFe61Bfl The film composition w as determ ined by EDX The fillm thickness w as set to approxim ately 200 nm After depositing, the sam ples were annealled a t 700"c for 20 rnin u n d er hea tin g ra te of 60"C/min an d 300°c/m in in th e applied field o f 0,7T M agnetic properties of the film s w ere ev a lu ated by vibrating sam ple

m agnetom eter T he surface im age of th e films w as observed by SEM an d AFM

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3 R e s u lts a n d d is c u s s io n

Influence of h ea tin g ra te on m icrostructure an d m agnetic p ro perties of th e film s has been studied Fig 1 show s SEM im ages of NdFeB th in film s a s deposited (a) a n d afte r annealed (b, c) I t show s th a t th e surface of deposited film w ere sm oothly However, afte r annealed a t 700°c for 20 m in w ith different hea tin g ra te s, th e cry sta l p artic le s w ere clearly observed F or th e film s w ith h ig h er heating ra te (300°c/m in), m ost of th e crystal particles

a re th e sam e size of 100 nm (fig.l b) C ontrarily, for th e lower h e a tin g ra te films (60°c/m in,), th e grain size is different each other, some o f them w ere over 300 nm d iam ete r (fig- 1c)

a) As deposit b, Hi’atinfi rate o f c) H eating rate o f

.W O O C'm m f i o n c m w

F ig l SEM images of NdFeB films as deposit (a), after annealed

at 700uc for 20 min (b, c)

AFM im age of th e film after annealed at

700°c for 20 m in w ith h ea tin g ra te of 300°c/min

w as showed in fig 2 It corresponds to th e SEM

im age in fig lb

M agnetic properties of NdFeB film s have been

investigated by vib ratio n sam ple m agnetom eter

Fig 3 shows h y steric loop of deposited film (a), after

annealed a t 700°c for 20 m in w ith different hea tin g

ra te 0>, c) I t shows th a t a s deposited film w ere soft FigÆ AFM image oi thc rJm after

m agnetic film s (Hc=50 Oe) A fter annealed, h a rd annealed at 7000C for 20 min with

m agnetic property h a s been observed, coercivity of heating rate of 3000C/min

th e film is th e sam e in both directions

(perpendicular an d p arallel to th e film): He// = H c l

= 1650 Oe an d He// = H c l = 9 0 0 0 e for the sam ple of 300°c/m in an d 60°c/m in h e a tin g rate, respectively

In th is study, sam ples w ere first annealed a t 700°c for 20 m in w ith h ea tin g ra te of 300°c/m in an d second annealed a t 500°c for 10 m in th en cooling to room tem p e ra tu re in applied field (Ha) of 0.7T The applied fields w ere both p erp endicular (Hax) and parallel

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a )

Fig.3 Hysteric loops of deposited film (a),

after annealed at 700nc for 20 min

with different heating rates

c )

T ab 1 V alues of He and M r of the films with and w ithout field cooling

Tab 1 show s th a t th e sam ple of perpendicular applied field (Hai); perpendicular

coercivity H c l w as increased an d parallel coercivity HeII was decreased For th e sam ple of

parallel applied field H^/J H c lw a s decreased an d He// w as increased R em anent

m agnetization (Mr) w as th e sam e effective a s coercivity

4 C o n c lu s io n

For th e N dFeB film s w ith high hea tin g ra te (300°c/min), the grains are absolutely the sam e size of lOOnm T h at cause good m agnetic properties H c=16500e and M r = 6200Gauss

The coercivity an d re m a n en t m agnetization of th e films, which w ere cooled in applied field, show th a t a r e increased following th e direction of the applied field

R e fe re n c e s

1 N N akanishi, M Ueda, T Okada, N Mizutani, Jour Magn Magn Mater., 197(1999), 295-

296

2 S.N Piram anayahgam M Masumoto, A Morisaco, s Takei, Journal o f Alloys and

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