In this study, a comprehensive study of 2D ZnO made by sol-gel, atomic layer deposition (ALD) method, 3D ZnO nanorods grown from sol-gel seed layer and ALD seed layer was carried out. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to characterize the morphology of the films.
Trang 1Original Article
Physical properties of 2D and 3D ZnO materials fabricated by
multi-methods and their photoelectric effect on organic solar cells
Sheng Bia,b, Yu Lia,b, Yun Liuc, Zhongliang Ouyangd, Chengming Jianga,b,*
a Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, PR
China
b Institute of Photoelectric Nanoscience and Nanotechnology, Dalian University of Technology, Dalian, 116024, PR China
c School of Physics, Dalian University of Technology, Dalian, 116024, China
d Department of Electrical and Computer Engineering, Center for Materials for Information Technology, The University of Alabama, Box# 870209,
Tuscaloosa, AL, 35487, USA
a r t i c l e i n f o
Article history:
Received 9 October 2018
Received in revised form
12 November 2018
Accepted 12 November 2018
Available online 20 November 2018
a b s t r a c t ZnO material is a crucial layer for organic solar cell due to its excellent photoelectric properties However, the influence of ZnO fabricated by various methods as well as the effect of 2-dimensional (2D) and 3-dimensional (3D) configuration is still under debate In this study, a comprehensive study of 2D ZnO made by sol-gel, atomic layer deposition (ALD) method, 3D ZnO nanorods grown from sol-gel seed layer and ALD seed layer was carried out Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to characterize the morphology of thefilms X-ray photoelectron spectroscopy (XPS) were used to probe bonding nature as well as defects present in different forms of ZnO Band gap and crystal quality were characterized by UV-vis spectra The inverted structure of organic solar cells was fabricated using these forms of ZnO, and the I-V curves as well as the power conversion efficiency (PCE) were measured to evaluate the photoelectric property of the synthesized ZnO nanostructures It is found that 2D ZnO made by the sol-gel method yields the best PCE of 2.53%
© 2018 Publishing services by Elsevier B.V on behalf of Vietnam National University, Hanoi This is an
open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/)
1 Introduction
Nanoscale control of metal oxide architectures is a crucial
technique to enhance the performance of the devices[1e6] Zinc
oxide (ZnO) is regarded as one of the most widely used materials
due to its extraordinary photoelectric properties, significant
phys-ical, chemphys-ical, mechanphys-ical, and bio-compatible characteristics[7,8]
It is a semiconductor with a large bandgap of 3.4 eV and a large
excitation binding energy of 60 meV that possesses applications in
optoelectronic devices[9], such as solar cells[10e15], light emitting
diodes[16], and image sensors[17] Chemical vapor deposition[18],
pulsed laser deposition[19], solegel process[20], electrochemical
deposition[21]and numerous other methods have been adopted to
synthesize different kinds of ZnO nanostructures, such as nanorods,
nanotubes, nanobelts and nanofilms etc Among these methods,
the sol-gel method with an excellent compositional control, low crystallization temperature and preferential orientation and pho-toluminescence[20], and atomic layer deposition (ALD) method [22,23]is widely used due to a number of advantages However, for the organic solar cell application, influences of 2-dimensional and 3-dimensional ZnO nanostructures as well as the function of various ZnO fabrication methods are still unknown
In this paper, 2-dimensional and 3-dimensional ZnO fabri-cated by both sol-gel and ALD method were studied and the
efficiency of organic solar cells with an inverted structure was evaluated by applying these ZnO layers P3HT and PCBM were used as benchmark for the study Quality of the 2Dfilms and 3D nanorods grown by various methods was examined by scanning electron microscopy (SEM) and atomic force microscopy (AFM) Binding energy of the 2D and 3D ZnOfilms was tested by X-ray photoelectron spectroscopy (XPS) Absorbance properties were measured by ultraviolet-visible (UV-vis) spectrometer Organic solar cell devices fabricated using the above 2D and 3D ZnO further confirm the photoelectric property of the materials made
by these methods It is anticipated that our findings will contribute to the development of thefield
* Corresponding author Key Laboratory for Precision and Non-traditional
Machining Technology of the Ministry of Education, Dalian University of
Technol-ogy, Dalian, 116024, PR China.
E-mail address: jiangcm@dlut.edu.cn (C Jiang).
Peer review under responsibility of Vietnam National University, Hanoi.
Contents lists available atScienceDirect Journal of Science: Advanced Materials and Devices
j o u r n a l h o m e p a g e : w w w e l s e v i e r c o m / l o c a t e / j s a m d
https://doi.org/10.1016/j.jsamd.2018.11.003
2468-2179/© 2018 Publishing services by Elsevier B.V on behalf of Vietnam National University, Hanoi This is an open access article under the CC BY license ( http://
Journal of Science: Advanced Materials and Devices 3 (2018) 428e432
Trang 22 Experimental
P3HT and PCBM were purchased from Solarmer and Nano-C,
respectively, and used as received ITO glass was cleaned in
deter-gent, de-ionized water, acetone and isopropyl alcohol in sequence,
and treated with oxygen plasma at 30 W for 5 min In sol-gel method
for 2D ZnOfilm fabrication, appropriate amount of zinc acetate
dihydrate (Zn(CH3COO)2$2H2O) was dissolved in 2-methoxyethanol
(CH3OCH2CH2OH) with ethanolamine (NH2CH2CH2OH) as additive
and vigorous stirred for 24 h to form 0.1 mM sol-gel ZnO solution
In ALD method, diethylzinc solution and water were used to
synthesize 60 nm-thick ZnO film according to the formula Ζn
(C2Н5)2þ Н2Ο ¼ ΖnΟ þ 2C2Н6 In nanorod growth, 10 nm-thick seed
layer was deposited onto pre-cleaned ITO glass by either ALD
method or sol-gel method followed by hydrothermal method for
2 h at 90C P3HT-PCBM (1:1 wt, concentration of 25 mg/mL in
chlorobenzene) was spin-coated onto the pre-fabricated ZnOfilm at
the spin-speed of 900 rpm for 45 s MoO3was thermally evaporated
at the rate of 0.3Å/s for 10 nm followed by silver deposition at the
rate of 1Å/s for 60 nm I-V characterization of polymer photovoltaic
cells was conducted using a computer-controlled measurement unit
from Agilent technologies B1500A semiconductor parameter
analyzer under ambient condition with illumination of AM1.5G,
100 mW/cm2 Thin Au was sputtered onto the sample to increase the
conductivity of the ITO glass for electron transportation The samples
were then transferred into the chamber of SEM for observation.Fig 1
illustrates the structure of organic solar cells with 2D and 3D ZnO
layers.Fig 1(a) is the configuration of the devices directly fabricated
by 2D ZnO film from ALD and sol-gel methods, while 3D ZnO
nanorods were grown from thin seed layers deposited by ALD and
sol-gel methods, as shown inFig 1(b)
3 Results and discussion
Morphology of the 3D ZnO nanorods was taken by SEM as
shown inFig 2(a) and (b) and the roughness of the 2Dfilms were
tested by AFM as displayed inFig 2(c) and (d) The two SEM images
share the same scale bar of 100 nm and the scale bars of the inset
are both 500 nm In the SEM image, the ZnO nanorods grown from
both ALD seed layer and sol-gel seed layer demonstrate a dense 3D
structure and it is clearly revealed that the ZnO nanorods were
successfully grown from depositional thin seed layer, but the latter
exhibits superior vertical orientation Both of the nanorods present
a hexagonal crystal growth indicating the presence of the ZnO
wurtzite crystal lattice AFM measurements were carried out to test
the quality and uniformity of the 2D ZnOfilm In the 2D film made
by sol-gel method, highly ordered surface texture was observed
with a roughness of 0.425 nm On the contrary, the morphology of
the ALDfilm indicates a granular property and aggregates
nano-particles The roughness of the ALD 2Dfilm is 3.486 nm
Morphology of the 3D ZnO nanorods is crucial for the perfor-mance of the organic solar cells There are several reasons that might result in lower device performance with 3D ZnO nanorod Firstly, the density of ZnO nanorod might play an important role The closely packing ZnO nanorods prevent P3HT-PCBM solution from getting well contact with ZnO and ITO layer As a consequence, charge carriers are getting blocked at P3HT-PCBM/ZnO interface, which eventually lead to much lower charge carrier transportation and higher recombination Also, not upright-grown nanorods will also result in the same problem[24] On the other hand, thin but long nanorods will result in a high resistance It is well understood that the resistance depends on the cross section area and the length
of the channel The ZnO nanorods act as a channel for charge carrier transportation Higher resistance would result in lowerfill factor and S-shape currentedensity curves Furthermore, the length of the ZnO nanorods is also important It is known that longer grow time leads to long but more vertically straight nanorods However,
if the nanorods are too long to break through the top electrode of the organic solar cells, there would be a short circuit and a mis-matched band diagram, which eventually exhibit no or low
efficiency[25]
A further study is necessary to explore the structural properties
of the 2D ZnOfilms and 3D ZnO seeded nanorods made by the two methods Zn 2P3=2 were tested using XPS According to Fig 3, preliminary observation indicates the films from sol-gel method have a higher binding energy compared to that from ALD method The binding energy of ZnO nanorods from sol-gel seed layer has the lowest binding energy The Zn 2P3=2peaks of sol-gelfilm and ALD film were observed at 1022.1 eV and 1021.9 eV, respectively, which
is the binding energy between zinc and oxygen Compared with the films made by ALD, the Zn 2P3 =2peak of nanorods made from ALD
seed layers demonstrates a right shift of around 0.4 eV On the contrary, the Zn 2P3=2peak of nanorods fabricated from sol-gel seed layer nanorods shift to the lower binding energy The positive shift
is mainly due to the oxygen vacancies on the utmost surface or the increasing concentration of acceptors such as zinc vacancies, which cause surface energy variation[26,27] Also, the negative shift can
be explained by the oxygen vacancies resides within the bulk ZnO [26,27] It is reasonably understood that 2D ZnOfilms made by sol-gel and ALD methods may exit internal defects, while 3D ZnO nanorods fabricated from ALD seed layer and sol-gel seed layer may exit surface defects The internal defects may introduce defect level and the surface defects may act as recombination centers for charge carriers The less the surface defects in ZnOfilm, the less negative effects on and carrier mobility and thus worse power conversion
efficiency (PCE)[28] The more surfaces and interfaces in nanorods also increase the possibility of recombination, which lowers the PCE of organic solar cells
Band gap as well as absorbance of ZnO are other key factors that possess great influence on the performance of the solar cells The band gap calculated by Tacu plot (in Equation(1)) method for ZnO
film and (b) 3-dimensional seeded ZnO nanorods.
S Bi et al / Journal of Science: Advanced Materials and Devices 3 (2018) 428e432 429
Trang 3fabricated by sol-gel, ALD, ALD seed, sol-gel seed are 3.4 eV, 3.25 eV,
3.21 eV and 3.1 eV, respectively
(ahv)1n= ¼ A hv Eg
(1) wherea is absorption coefficient, h is Planck constant, V is
fre-quency, Eg is semiconductor forbidden bandwidth, A is constant
which depends on the type of the semiconductor: 0.5 for direct
band and 2 for indirect band Compared with the band gap of
intrinsic ZnO, which is 3.302 eV, the band gap of ZnO made by
sol-gel method is higher than that of intrinsic ZnO According to the
Burstein-Moss band gap compensation effect, the Fermi energy of
ZnO made by sol-gel method is closer to the bottom of conduction
band which leads to a wider band gap and higher carrier
concen-tration[29] It is well known that defect is one of the reasons that
causes band gap variation UV-vis spectra of both 2Dfilms and 3D
nanorods were illustrated inFig 4to explore the type of defect as
well as crystal quality Compared with 3D nanorods made from ALD
seed layer, the 2D ALD films show a red-shift in absorbance
indicating the enhanced oxidability On the contrary, the sol-gel 2Dfilms display a blue-shift in absorbance compared to the 3D nanorods fabricated from sol-gel seed layer demonstrating improved reductibility Moreover, when light shines onto the de-vice, absorption, reflection and transmission will act on films The more transmission, the better chance the light will reach the active layer which will generate charge carriers and thus generate elec-tricity It is observed from thefigure that ZnO made by ALD has the highest absorbance which might result in less light reaches to P3HT and PCBM layer The absorbance of the ZnO fabricated by sol-gel method is the lowest, which might give the best external quan-tum efficiency (EQE) to the device
Performance of the organic solar cells fabricated with different kinds of ZnOfilms was measured and I-V curve were plotted in
Fig 2 Top view of SEM image of 3D ZnO film from (a) sol-gel method seed layer and (b) ALD seed layer ZnO nanorods with side-view image in the inset AFM image of the 2D ZnO film fabricated by (c) sol-gel method and (d) ALD method.
Fig 3 XPS curves of (a) the sol-gel film, (b) ALD film, (c) ALD seeded nanorods, and (d) Fig 4 UV-vis spectra of the ALD film, sol-gel film, ALD seeded nanorods and sol-gel
S Bi et al / Journal of Science: Advanced Materials and Devices 3 (2018) 428e432 430
Trang 4Fig 5 The ZnOfilm from sol-gel methods gives a beautiful curve
with highest open circuit voltage (VOC) and short circuit current
(ISC), while the ALDfilm shows an S-shape curve The ones from the
ZnO nanorods have comparably low VOC The physical parameters of
the devices made by various ZnO nanostructures are summarized in
Table 1 The performance of the solar cells with 2D ZnO fabricated by
the sol-gel method is better than the 3D ZnO from the sol-gel seed
layer The performance of the solar cells with 2D ZnO fabricated by
the ALD method is also better than the 3D ZnO from the ALD seed
layer The 2D ZnO made by the sol-gel method is better than that
from the ALD method, while the 3D ZnO fabricated from the sol-gel
seed layer is worse than that from the ALD seed layer
4 Conclusion
The 2D and 3D ZnO materials prepared by ALD, sol-gel,
ALD-seed and sol-gel ALD-seed methods were adopted to fabricate
P3HT-PCBM based solar cells The SEM and AFM characterizations
indi-cate that the morphology of ZnO made by these methods has a
distinct variation in the aspect offilm roughness and the dimension
as well as the direction of nanorods Also, the existence of zinc and
oxygen vacancies in ZnO from different fabrication methods leads
to band gap alternation ZnO fabricated by 2D sol-gel method has a
higher band gap than that of intrinsic ZnO, while the band gaps of
ZnO fabricated by other methods are lower than that of intrinsic
ZnO Furthermore, UV-vis spectra exhibit not only the transmission
property of ZnO, but also the quality of crystal structures, which is
reflected by the red-shift and blue-shift in the spectra It is found
that 2D ZnO from the sol-gel method has the best crystal structure
while 3D ZnO from the sol-gel seed layer gives the worst property
By fabricating the inverted P3HT-PCBM solar cell with these ZnO
layers, it is found that the one with the 2D sol-gel method yields the
highest PCE of 2.53% We hope our finding will promote the development of thefield
Acknowledgments This project wasfinancially supported by National Natural Sci-ence Foundation of China (NSFC, 51702035 and 51602056), and Dalian University of Technology, China, DUT16RC(3)051
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Table 1
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V OC (V) I SC (mA/cm 2 ) FF (%) PCE (%)
sol-gel 0.57 8.221 53.99 2.53
ALD seeded 0.27 5.388 41.72 0.61
sol-gel seeded 0.17 6.690 37.28 0.42
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