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11, 349–358, 2015 A 65 nm CMOS Ultra-Low-Power Impulse Radio-Ultra-Wideband Emitter for Short-Range Indoor Localization Mohamad Al Kadi Jazairli∗ and Denis Flandre ICTEAM Institute, Univ

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Low Power Electronics Vol 11, 349–358, 2015

A 65 nm CMOS Ultra-Low-Power Impulse Radio-Ultra-Wideband Emitter for Short-Range Indoor Localization Mohamad Al Kadi Jazairli∗ and Denis Flandre ICTEAM Institute, Université Catholique de Louvain, Louvain-la-Neuve, 1348, Belgium

(Received: 14 April 2015; Accepted: 15 July 2015) This paper presents an ultra-low-power IR-UWB pulse generator based on a dedicated design of a

chain comprising of a voltage controlled ring oscillator, a buffer and a pulse shaping filter A control

voltage can be used to set the pulse repetition frequency The design was made using 65 nm CMOS

technology The design was optimized in order to meet target specifications (pulse width, repetition

frequency, PSD, etc.) that are suitable for short-range indoor localization The generator produces

a pulse having 0.5 ns width and 930 mV peak-to-peak amplitude prior to the antenna The−10 dB

bandwidth is from 1 to 7 GHz with an amplitude less than−40 dBm/MHz which makes it compliant

with the FCC spectral mask The energy consumption is 1.5 pJ per pulse while the energy driven

to the antenna is 60 to 65% of the total energy consumed by the circuit per pulse According to the

state-of-the-art, this is the minimum consumption that we were able to achieve

Keywords: Impulse Radio, Low Power, Pulse Generator, Transmitter, UWB

1 INTRODUCTION

Ultra-Wideband (UWB) technology appears very

promis-ing for radio communication and localization UWB

sig-nals have a very wide bandwidth with allocated frequency

spectrum from 3.1 GHz to 10.6 GHz and with a

max-imum emitted power being restricted to −41 dBm/MHz

in compliance with the Federal Communications

Com-mission (FCC).1 Energy can be spread over a very wide

bandwidth to very low levels allowing UWB radios and

narrowband broadcasters to share the spectrum without

causing undesirable interference; this in turn generates

numerous interesting and novel application

opportuni-ties These characteristics of UWB implementations are

of utmost interests for low-cost, short-range sensors

and smart devices with ultra low power consumption

Another advantage of the low power transmitter is the

size reduction of the transmitted antenna which allows

a single die transmitter to be implemented in an area

of 4 mm2.2

In this work, one of our objectives is to design an

extremely low power CMOS-integrated pulse generator

for short-range indoor localization In order to achieve

this, we considered the common form of UWB that is

∗ Author to whom correspondence should be addressed.

Email: mohamad.alkadi@uclouvain.be

called IR (Impulse Radio) which employs sub-nanosecond pulses without a carrier signal The transmitter can be used

in both amplitude modulation (PAM) and pulse-position modulation (PPM)

Several IR-UWB circuits have been proposed in the lit-erature To produce the UWB output pulse, some papers used the LC topology3–5 while others used the ring oscil-lator topology.6 7 Those who used the LC topology man-aged to produce a sub-nanosecond pulse (∼0.5 ns) but

in expense of high consumption of energy per pulse

(> 4 pJ/pulse) While those who used the ring

oscilla-tor topology managed to consume less energy per pulse

(< 5 pJ/pulse) but failed to produce a sub-nanosecond

pulse Here our target was to reach sub-nanosecond pulse with an energy consumption of less than 1 pJ/pulse Other implementations details will be compared in a later sections

We have expanded the Voltage Control Ring Oscil-lator (VCRO) circuit architecture presented in Ref [8]

In Ref [8], 0.5 m SOS technology was used to produce

a single pulse with 800 ps width but without taking into consideration the exact UWB requirements on the pulse shape Here by porting this VCRO to 65 nm CMOS and introducing a proper design of buffer and pulse shaper, along with the right element sizes and filter shaping cir-cuit, we can generate a pulse shape with a Power Spectral

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P3

2

1

1

M0

C1

VCRO Buffer Antenna

Pulse Shaping Filter

VCCA

V control

RL VCCB

Fig 1 Proposed UWB pulse generator.

Density (PSD) which complies with the FCC mask One of

the most important issues addressed in the design has been

achieving ultra low power consumption while maintaining

the same quality of the pulse shape and its corresponding

PSD for usual variations of process, supply voltage and

temperature (PVT)

This paper consists of several sections Section 2

addresses the required UWB pulse specification as well

as the evaluation of the minimum transmitted energy

per pulse that a generator should produce in order to

allow detection by the receiver for short-range

localiza-tion applicalocaliza-tions Seclocaliza-tion 3 describes the proposed UWB

pulse generator Section 4 gives a detailed explanation

of the VCRO analysis In Section 5, the results obtained

from the simulations and measurements are interpreted

Section 6, presents the experimental result of

transmit-ting train of pulses Section 7 investigates the effect of

PVT variations and subsequent calibrations on the pulse

generator

1.2

0

Time (ns)

1.2

400 ps

470 mV 0

0

Fig 2 Simulated pulse shape at the output of VCRO (upper curve), at

the output of buffer (middle curve) and at the 50  antenna resistance

(lower curve).

10

Normalized FCC mask

Normalized transfer response

of the pulse shaping filter

–20 0

Frequency (GHz)

–40

Pulse Shaping Filter Antenna

Ca Cb

Fig 3 Implementation and frequency response of the pulse shaping filter.

2 REQUIRED PULSE SPECIFICATIONS FOR LOCALIZATION

In a localization application, several requirements have

to be set in order to achieve an optimized UWB pulse generator.9 10 The shape of the IR-UWB pulse plays a major role in determining the quality of the pulse gener-ator According to Ref [10], the IR-UWB pulse must be

a monocycle pulse with a very short pulse width (shorter than 1 ns) to target a cm precision By applying the mono-cycle pulse directly to an UWB transmit antenna, it is transformed into a Gaussian-like pulse This Gaussian-like pulse is vital for fitting the PSD inside the regulation of the FCC mask Another factor that should be taken into consideration is the rate of the pulse repetition frequency (PRF), which has to be in the range of 1 to 500 MHz, this values of the PRF guarantees the possibility for each TX-RX pair to unambiguously distinguish between scat-tered pulses and direct lign-of-sight (LOS) pulses for any target position within the area and any nodes location.11

Finally, for the power consumption issue, according to Refs [12, 13], we can consider a low SNR of −10 dB that is still sufficient for good localization design The dependency on the pulse shape and the SNR is extensively studied in Refs [14 and 15]

To generate a pulse with minimal power consumption, first we have to determine the minimum Energy per pulse that could be transmitted in an indoor area and detected

Time (ns)

–1.2 0 1.2

φ1 φ2

0

Fig 4 Typical voltage versus time plots of the VCRO (Fig 1) node (1) (upper curve) and voltage difference between nodes (3) and (4) versus time (lower curve).

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Fig 5 The voltages at different interval nodes of the VCRO (Fig 1)

and the current flow in both phase 1 (a) and phase 2 (b) of Figure 4.

by the receiver This can be done calculating the

transmit-ted energy while taking into consideration several terms

such as the path loss between the transmitter and receiver,

Signal to Noise Ratio (SNR) and the level of noise floor

From standard telecommunication theory, the received

energy can be basically defined by the following equation:

Er= Et

where Er is the received Energy, Et is the transmitted

energy and PL is the path loss that can be determined by

the following equation for line-of-sight path:

PL =



4 · d · f c c

2

(2)

where d is the transmitter receiver distance, fc is the

cen-tral frequency and c is the speed of light.

Using the central frequency fc= 475 GHz (as shown in

Section 4), the path loss has been calculated using Eq (2)

to be 45.8 dB for 1 m distance and 65.8 dB for 10 m

distance between the transmitter and the receiver

The SNR can be determined from the following

equation:

SNR= Er

where N0is the noise spectral density in Watts per Hertz

Several values of SNR have been considered and for

each of these values, the minimum transmitted energy per

1.2

Inverter 1&2

Vin (v)

Inverter 3

1.2

1

0.8

0.6

0.4

0.2

Fig 6 Inverter DC characteristics (switching curve) for VCCA = 1.2 V.

Table I Transistor sizes and threshold voltages for each component in the VCRO shown in Figure 1.

Inverters 1 and 2 Inverter 3 p-MOS M0 C1

n-MOS: W= 0.12 m W= 0.36 m 5 fF

L= 0.1 m L= 0.1 m

Vt= High Vt= Low

p-MOS: W= 0.54 m W= 0.12 m W= 0.8 m

L= 0.1 m L= 0.1 m L= 0.1 m

Vt= Low Vt= High Vt= Low

pulse has been calculated using Eqs (1) and (3) while maintaining the worst case value of path loss (i.e., for 10 m

and N0/2 = 10−19W/Hz.14 15 ) The minimum E twas found

to be 0.48 pJ for SNR= 0 dB and 4.8 pJ for SNR = 10 dB For a short-range indoor application with a 5 m distance,

the minimum E t is 0.11 pJ at SNR= 0 dB and 1.1 pJ at SNR= 10 dB

These values of the transmitted energy per pulse should

be taken into consideration when implementing a very low power pulse generator, since at lower values there is a high probability of losing the transmitted signal

3 PROPOSED UWB PULSE GENERATOR

Figure 1 depicts the proposed UWB pulse generator It consists of a voltage controlled ring oscillator (VCRO),

a buffer and a pulse shaping filter

3.1 Voltage Control Ring Oscillator VCRO

In order to achieve a low-power, low-complexity and tunable VCRO, we considered the VCRO configuration shown in Figure 1 The basis of the VCRO is an impulse oscillator consisting of three CMOS inverter stages.8 16

A capacitor C1 and a p-MOS transistor M0 are inserted

before the last stage as shown in Figure 1 so as to define the pulse width and the delay between two consecutive pulses The way how C1 and M0 control these param-eters is explained in Section 4 The gate voltage of M0 (Vcontrol) is used to control the repetition frequency of the pulse generator To guarantee minimum pulse width, the last inverter is designed to have a fast switching transi-tion from High-to-Low as compared to the first and second

450 µm

100 µm

35 µm

30 µm

Fig 7 Fabricated UWB pulse generator.

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930 mV

1000 mV

Fig 8 Pulse shape at the output of the buffer (a) Measured and

(b) Simulated.

inverters Furthermore, the pulse width will be reduced by

scaling CMOS technology A typical waveform at the

out-put of the VCRO is shown in Figure 2 (upper curve)

3.2 Pulse Shaping Filter

As mentioned in Section 2, a proper filtering is required in

order to obtain a Gaussian–like pulse at the output antenna

so as to make it compliant with the FCC spectral mask

Figure 3 shows the normalized frequency response of the

pulse shaping filter and the normalized FCC spectral mask

for indoor UWB devices.17 In our simulators, the values

of the capacitors Ca= 0.25 pF, Cb = 0.15 pF and

induc-tor L= 2.5 nH are optimized to produce the Gaussian-like

waveforms shown in Figure 2 (lower curve) It is worth

mentioning that a pulse shaping circuit can also be

imple-mented within the UWB transmit antenna and thanks to

the low-pass filtering effect the generated pulse will be

shaped by the antenna frequency response Therefore, in

the experimental part of this work, we considered using

the pulse shaping filter built-in inside the antenna instead

of adding a separate pulse shaping filter

3.3 Buffer

To ensure that enough current is fed into the capacitors and

inductor of the pulse shaping filter, the buffer is designed

10

Frequency (GHz)

–20

0

0

5 –60

–40

FCC Mask

Fig 9 Measured power spectral density (PSD) of the output pulse.

–40

–60

Frequency (GHz)

0

Fig 10 Simulated power spectral density (PSD) of the output pulse.

as shown in Figure 1 The inverters here do not only isolate the VCRO from the high load of the pulse shaping filter but also provide current driving capability for the pulsed oscillator The first and second inverters in the buffer play a major role in the determination of the pulse width Adding

a middle p-MOS transistor in the second inverter as in

Ref [18] provides a fast switching transition from High-to-Low as compared to the first inverter in the buffer which reduces the minimum pulse width as shown in Figure 2 (middle curve) The supply voltage VCCB can be further used as a pulse output enable signal

4 VCRO ANALYSIS AND DESIGN

For design optimization purposes, we need to understand the operation scheme of the VCRO and how the capaci-tor C1 and the transiscapaci-tor M0 affect the time delay of the output signal.19 We divide the timing of one pulse into

two phases 1 and 2, as shown in Figure 4 Also, since

nodes number (3) and (4) in Figure 1 are essential nodes where the charging and discharging of the capacitor take place, we plot the difference of these voltages along with the output voltage versus time in Figure 4 It is worthwhile

noting that phase 1 (1) represents the case where V3 is

higher than V4 and hence V3 is the source of the

transis-tor M0, and phase 2 (2) represents the case where V4

is higher than V3 and hence V4 becomes the source of transistor M0 as depicted in Figure 5

Vcontrol (mV)

100 400

800

600

200

0

340 360 380 400 420

Measured PRF

Measured PW

Simulated PW Simulated PRF

Fig 11 Simulated and measured pulse repetition frequency (solid curves) and pulse width (dotted curves) as a function of Vcontrol for VCCA = VCCB = 1.2 V.

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Vcontrol (mV)

200

400

600

800

Total power consumption VCRO power consumption Buffer power consumption Energy consumption

0.4 0.8 1.2 1.6 2

0 0

Fig 12 Simulation of the power consumption and energy consumption

per pulse as a function of Vcontrol for VCCA = VCCB = 1.2 V.

Phase 1 starts with a high output voltage V1 that

sub-sequently yields a zero voltage at node (2) which in turn

gives a high voltage at node (3) equal to VCCA Given

that V4 from the previous period is still low due to the

delay introduced by M0 and C1, node (3) and node (4)

will be the source and the drain of the PMOS transistor

M0 respectively Moreover, since VSD > VSG–Vt, with

VSG= VCCA − Vcontrol, and Vt the absolute value of

the threshold voltage, this transistor operates in the

satu-ration region as long as V4 < Vcontrol+ Vt and its

con-trol current iD charges the capacitor C1 as shown in the

Figure 5(a) As long as M0 is operating in the

satura-tion mode, the charging of the capacitor C1 at a constant

current raises the voltage at node (4) at a steady rate as

observed in Figure 5(a) until V4 reaches a value close to

VCCA This high V4 value switches the last inverter and

gives a new zero output voltage at node 1

In phase 2, the initial zero voltage at node (1) yields

a voltage at node (2) equal to VCCA and a zero voltage

at node (3) Since node 4 is high from previous phase,

the source and drain of transistor M0 will be at node (4)

and node (3) respectively Given that VSD > VSG− Vt,

this transistor operates in the saturation mode and its

con-trol current iD charges the capacitor C1 as shown in

Figure 5(b) However, on the contrary to 1, the charging

of the capacitor decreases the source voltage at node (4)

Vcontrol (mV)

200

400

600

0

2 1.6 1.2 0.8 0.4 0

Fig 13 Measured power consumption and energy consumption per

pulse as a function of Vcontrol for VCCA = VCCB = 1.2 V.

Frequency (GHz) control (mV)

–100

100

0 20 40 60 80

–20 –40 –60 –80

(a)

(b)

Fig 14 (a) UWB antenna, (b) Antenna impedance as a function of frequency.

causing a decrease in VSD and VSG while maintaining

VSD > VSG− Vt Thus, the saturation current decreases

till it reaches a zero value when V4–V3 =0 which in turn makes the 3rd inverter switching from low to high and

reinitiates 1.

The duration that transistor M0 stays in any of these two phases depends on the values of Vcontrol, of C1, and of the switching thresholds between High-to-Low and

Low-to High for the last inverter To approach minimum pulse width, we designed the last inverter having a lower logic threshold as compared to the first and second inverters

as shown in Figure 6 Using this analysis, the threshold

voltage (V T), the width W  and the length L of the

inverters transistors and of M0 are chosen to optimize the sizes of the inverters to get the minimum pulse width as shown in Table I

The design was made in a 65 nm CMOS technology with low power and general purpose LP/GP transistor

930mV

350mV

16mV

(a)

(b)

(c)

Fig 15 (a) The signal transmitted from the pulse generator through the antenna, (b) the received signal at 1 cm, (c) the received signal at 100 cm.

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400

300

200

100

0

200 150

100 50

Distance (cm)

Measured received amplitude Theoretical received amplitude

Fig 16 The measured received amplitude (solid line) and theoretical

received amplitude (dotted line) versus distance.

property.20 A process called LP/GP Mix is available and

employs Low Power and General Purpose devices on the

same chip The advantage of using such 65 nm CMOS

process is the high performance, low power consumption

and the availability of multi threshold voltages LP devices

were used for the pulse generator to minimize power

con-sumption, GP devices were used for the buffer for high

speed pulse integrity The capacitor C1 was made using

n-MOS transitors that is placed inside an NWell so that

the bottom plate is all N type beneath the poly Figure 7

shows the fabricated pulse generator It is to be noted that

the pulse shaping filter was not fabricated on chip in order

to validate the CMOS emitter separetely and study whether

an adequate antenna can replace the pulse shaping circuit

Therefore, all the measurement results in the next section

are done without the pulse shaping circuit

5 MEASUREMENT RESULTS AND

ANALYSIS

5.1 Impulse Shape

The measurements were realized by connecting the 65 nm

die on a probe station using DC decoupled probes for

the power supply and Vcontrol, as well as connecting

500

0 400 800 1200

100 150 200 250 300 350 400 450

0

400 300 200 100

TT Vcontrol (mV)

T FF F SS S SF F FS Measured Me VDD=1.2V, T=25°c

Fig 17 Simulation of (a) Pulse repetition frequency versus Vcontrol, (b) Pulse width at Vcontrol = 100 (mV) for different process corners compared with measurements.

Time (s)

0

0.6

500 ps 0.8

0.4 1.2

Fig 18 Zoomed-in output waveform sensitivity using Monte-Carlo simulation.

a special 50  RF probe to the output buffer load to

guarantee minimum resistance and capacitor effect from the cables and pads Using the 16 GHz analog band-width Agilent DSO-X91604A digital sampling oscillo-scope, we measured the pulse shape shown in Figure 8(a)

at the output First, we compared the simulated result using the ELDO circuit simulator with the actual device output

In Figure 8, the peak-to-peak amplitude at the output of the buffer is 930 mV for the measured result while it is

1 V for the simulated result The pulse width is about

500 ps for the measured and 400 ps for the simulated result Moreover, it is worth mentioning that the signal shapes corresponding to other values of Vcontrol are sim-ilar to the ones shown in Figure 8 The measured spectra

of the output impulse train are shown in Figure 9, while the simulated power spectral density (PSD) is shown in Figure 10 Given the minimal emitted pulse energy, PSD

is always lower than−40 dBm/MHz, which makes it com-pliant with the FCC mask for all frequency band It is important to mention that this spectra result is obtained without connecting the pulse shaping circuit Here, the UWB antenna parameters work as a pulse shaping circuit and cut the spectra at low frequency making it comply with the FCC mask

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Vcontrol (mV)

800

0

100

600

400

200

699

695

691

250 246 242

32 30 28 27

3.2 3 2.8

400

Fig 19 Sensitivity of the pulse repetition frequency versus Vcontrol.

5.2 Pulse Frequency and Pulse Width

Our UWB pulse generator further provides a tunable pulse

repetition frequency In Figure 11, for supply voltages

VCCA and VCCB set to 1.2 V, and for typical

pro-cess conditions, the simulated pulse frequency decreases

from 700 to 50 MHz as the control voltage increases

from 100 mV to 350 mV The pulse width (red dotted

curve in Fig 11) varies slightly when the pulse frequency

decreases, from 350 ps at 700 MHz to 420 ps at 10 MHz

As to the measured result (shown in Fig 11), it validates

the controelability of the transmitter The pulse frequency

decreases from 450 MHz to 3 MHz as the control

volt-age increases from 100 mV to 350 mV The pulse width

(the black dotted curve in Fig 11) varies slightly when

the pulse frequency decrease, from 495 ps at 450 MHz

to 410 ps at 3 MHz The quantitative difference between

the simulated and measured result are due to the fact that

our circuit operates closer to the slow process corner than

to the simulated typical process corner as explained in

Section 7

5.3 Power and Energy Consumption

The total power consumption of the transmitter sums up

the VCRO and buffer In Figure 12, the simulated power

consumption dominated by the buffer stage is decreased

At 120°C

Frequency (GHz)

–40

–20

–40

500

0

400 300 200 100

Pulse width (ps)

600 700 800

25ºC –40ºC 120ºC

25ºC –40ºC 120ºC

Pulse Repetition Frequency-PRF (MHz)

(a)

(b)

At 25°C At–40°C

VDD=1.2V,Process:TT

Fig 20 Normalized power spectral density (PSD), (b) Pulse width and PRF of the output pulse simulated at different temperatures.

from 720 W for a pulse repetition frequency of 700 MHz

to 118 W for a pulse repetition frequency of 98 MHz

at 1.2 V supply voltage In terms of energy consumed per pulse, the pulse width corresponds to an increase from

1 pJ to 1.2 pJ as Vcontrol increases from 100 to 250 mV

as shown in Figure 12 The measured results shown in Figure 13 confirm the trends and orders of magnitude with process deviations The power consumption including the

buffer stage is decreased from 521 W for a pulse repeti-tion frequency of 450 MHz to 82 W for a pulse repetirepeti-tion

frequency of 100 MHz at 1.2 V voltage supply In terms of energy consumed per pulse, this corresponds to an increase from 1.1 pJ to 1.5 pJ as Vcontrol increases from 100 mV

to 250 mV as shown in Figure 13

Regarding the driven energy per pulse to the 50  load,

this corresponds to an increase from 0.75 pJ to 0.9 pJ as Vcontrol increases from 100 to 250 mV, which implies that approximately 60–65% of the energy consumed is driven

to the antenna As explained in Section 2, these values of energy per pulse are the minimum values that the pulse generator must transmit in order to be detected by the receiver

Finally, it is important to mention that we can stop the output pulse emission at any time by either applying a zero voltage on VCCB, or by applying a voltage higher than 400 mV on Vcontrol By applying such voltage, the transistor M0 will not operate in on regime anymore, so

no oscillation can take place

6 TRANSMISSION OF PULSES

We next connected the pulse generator with the UWB antenna designed at UCL21 shown in Figure 14(a), and

we transmitted the signal from the pulse generator through

a paired emitter and received antennas so as to study the received signal by using a Digital Sampling Oscillo-scope The variation of the UWB antenna impedance with respect to the frequency is shown in Figure 14(b) The upper blue curve represents the real resistance value of the antenna By taking a look at our operating bandwidth

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which is between 2.5 GHz and 7 GHz, we find that the

resistance varies between 20  and 70  The lower red

curve in Figure 14(b) represents the imaginary part of the

impedance, it varies between −20  and 20  in our

operating frequency range It is worth mentioning that the

negative value represents a capacitive reactance (1.3 pF at

X = −20 ) while the positive value represents an

induc-tive reactance (10 nH at X = 20  It is notable that

in Section 5 we took into consideration these values as

well as the extra capacitance and resistance values that are

added to the circuit from the cables and the instruments

while simulating our design in order to reach an

accu-rate comparison between the simulated and the measured

result

The control voltage is set to obtain a 100 MHz pulse

repetition frequency The pulse generator generates the

train of pulses shown in Figure 15(a) at the input of

the UWB antenna The received signal is shown in

Figures 15(b), (c) The peak to peak amplitude is around

350 mV for 1 cm distance between the transmitted and

received antenna, while it is 16 mV for 100 cm

dis-tance between the antennas The drop in voltage between

Figures 15(a)–(c) is due to the cable losses between the

pulse generator and the antenna as well as due to the

dis-tance In Figures 15(b) and (c), we can easily recognize

the effect of the UWB antenna, where the design of the

antenna converts the simple pulse to a monocycle impulse

shape, giving the output pulse the necessary shape to make

it comply with FCC mask In Figure 16, the solid curve

represents the measured received amplitude as a function

of the distance between the antennas The dotted line

rep-resents the simulated receiving amplitude as directly

pro-portional to 1/d, where d is the distance between the

antennas This was done because ideally the amplitude

should decrease in a ratio of 1/d as a function of distance.

From the two curves in Figure 16 we observe that the

measured curve follow a trend very close to the theoretical

curve calculated for ideal propagation It is important to

note that a bigger range can be obtained by optimizing the

VCCA,VCCB (V)

500

0

400 300 200 100

600 700 800

Pulse width (ps)

Pulse Repetition Frequency-PRF (MHz)

1.1V 1V 1.2V1.3V 1.4V

1.1V 1V 1.2V1.3V 1.4V

Fig 21 (a) Simulated output voltage, (b) Pulse width and PRF at different supply voltages.

Table II Measured results.

pulse shaping circuit and the antenna as well as minimiz-ing the parasitics from the cables in order to reduce the energy losses

7 PVT VARIATIONS

The pulse generator of Figure 1 is examined under Process, Voltage and Temperature (PVT) variations

In Figure 17(a), the results of corner simulations are shown for an input control voltage Vcontrol varying between 100 and 500 mV It is observed that the SF (Slow NMOS, Fast PMOS) and FF (Fast NMOS, Fast PMOS) corners provide a very high repetition frequency compared

to the other cases, which mean that with fast PMOS we obtain fast repetition frequency This is expected since the repetition frequency is directly proportional to the phase

2 (as explained in Section 4) and M0 in which the PMOS

transistor plays the major role for the duration of phase

2 Also from Figure 17, we can see that the measurement

results fall between TT (Typical NMOS, Typical PMOS) and SS (Slow NMOS, Slow PMOS) corners

For a localization application, which is our target, the maximum required pulse frequency is up to 200 MHz In Figure 17, we can observe that all the corners meet the requirements for localization within the range of 200 MHz

A Monte Carlo simulation of 50 runs around typical process (TT) parameters is done to estimate the system sensitivity to device mismatch Figure 18 shows a

zoomed-in version of the output waveform sensitivity The output signal shows a reasonable timing difference but not for amplitude or pulse width as a result of device mismatch

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Table III Comparison with previously reported pulse generators.

Technology per pulse (pJ/pulse) amp (mVpp) Pulse width (ns) Pulse type Band (GHz) area (mm 2 )

variations Figure 19 shows the repetition rate sensitivity

with the variation of device mismatch It can be easily

seen that the difference in pulse frequency is very small

and can be neglected

The PSD results at different temperatures are shown

in Figure 20(a) The −10 dB bandwidth at −40 C is

4.2 GHz which is from 2.2 to 6.6 GHz, while at 120C

the bandwidth becomes 5.2 GHz which is from 2.2 to

7.4 GHz Figure 21(a) shows different output voltage

cor-responding to a variation of the supply voltage VCCA=

VCCB The peak-to-peak amplitude across the 50 

out-put load slightly decreases when the supply voltage is

decreased to 1.1 V, and slightly increases when the supply

voltage is increased to 1.3 V As shown if Figures 20(b)

and 21(b) the difference caused by the variation of

tem-perature and voltage on the pulse repletion frequency and

pulse width is very small and would have a negligible

effect in applications such as localization.9 10

8 CONCLUSION

In conclusion, an ultra-low-power frequency-tunable UWB

pulse generator has been reported in this paper The pulse

repetition frequency varies from 450 MHz to 3 MHz and

the power consumption varies from 521 W to 82 W

for VCCA= VCCB = 1.2 V when Vcontrol varies from

100 mV to 250 mV The energy consumed per pulse

increase from 1.1 pJ to 1.5 pJ, this is the minimum energy

per pulse that a pulse generator can transmit so that to be

detected by the receiver in a short-distance indoor

applica-tions Measured results are summarized in (Table II) and

very favorably compare to state-of-the art (Table III) in

terms of low energy consumption for achieved pulse peak

amplitude, short pulse width, large frequency band and

small active die area

Acknowledgment: The authors would like to thank

Professor Luc Vandendorpe and Dr Achraf Mallat for their

kind suggestions and help, Professor Christophe Craeye

and Dr Farshad Keshmiri for the design and the

fabrica-tion of UWB antenna, Pascal Simon for the assistance with

measurements in the WELCOME lab (Wallonia

Electron-ics and Communications Measurements)

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Mohamad Al Kadi Jazairli

Mohamad Al Kadi Jazairli received a B.S degree in Electrical Engineering from Beirut Arab University (BAU), Beirut, Lebanon,

in 2005, and a M.S degree in Molecular Electronics and System Design from Linköping University, Linköping, Sweden, in 2008 Since then he joined the Institute of Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM),

at Université catholique de Louvain (UCL), Louvain-La-Neuve, Belgium, where he is currently pursuing his doctoral studies His research interests are in the field of ultra-low-power analog circuits, UWB communication, RFID and sensor design.

Denis Flandre

Denis Flandre Denis Flandre (M’85–SM’03) received the M.S degree in Electrical Engineering, the Ph.D degree and the Research Habilitation from the Université catholique de Louvain (UCL), Louvain-la-Neuve, Belgium, in 1986, 1990 and 1999, respectively His doctoral research was on the modelling of Silicon-on-Insulator (SOI) MOS devices for characterization and circuit simulation, his Post-doctoral thesis on a systematic and automated synthesis methodology for MOS analog circuits Since 2001, he is full-time Professor at UCL He is currently involved in the research and development of SOI MOS devices, digital and analog circuits, as well as sensors and MEMS, for special applications, more specifically high-speed, low-voltage low-power, microwave, biomedical, radiation-hardened and high-temperature electronics and microsystems He has authored or co-authored more than 900 technical papers or conference contributions He is co-inventor of 11 patents He has organized or lectured many short courses on SOI technology, devices and circuits in universities, industrial companies and conferences He has received several scientific prizes and best paper awards.

He has participated or coordinated numerous research projects funded by regional and European institutions He has been a member

of several EU Networks of Excellence on High-Temperature Electronics, SOI technology, Nanoelectronics and Micro-nano-technology Professor Flandre is a co-founder of CISSOID, a spin-off company of UCL focusing on SOI and high-reliability integrated circuit design and products He is scientific advisor of two other UCL start-ups : INCIZE (Semiconductor characterization and modeling for design of digital, analog/RF and harsh environment applications) and e-peas (Energy harvesting and processing solutions for longer battery life, increased robustness in all IoT applications) He is an active member of the SOI Industry Consortium and of the EUROSOI network He is an IEEE Senior member.

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