Formation of ZnO thin films consisting of nano-prisms and nano-rods with a highYe Bin Kwona, Seung Wook Shinb, Hyun-Ki Leea, Jeong Yong Leeb, Jong-Ha Moona, Jin Hyeok Kima,* a Department
Trang 1Formation of ZnO thin films consisting of nano-prisms and nano-rods with a high
Ye Bin Kwona, Seung Wook Shinb, Hyun-Ki Leea, Jeong Yong Leeb, Jong-Ha Moona, Jin Hyeok Kima,*
a Department of Materials Science and Engineering, Chonnam National University, 300 Yongbong e Dong, Puk-Gu, Gwangju 500-757, Republic of Korea
b Photonics Technology Research Institute, Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Republic of Korea
a r t i c l e i n f o
Article history:
Received 6 September 2010
Received in revised form
22 November 2010
Accepted 26 November 2010
Available online 4 December 2010
Keywords:
ZnO thin film
Nano structure
Hydrothermal technique
Low growth temperature
a b s t r a c t
ZnO thinfilms that consist of elongated nano-prisms and nano-rods were successfully grown on 100 nm-thick ZnO seeded glass substrates by hydrothermal synthesis at 60C and pH 10.3 in an aqueous solution containing Zn(NO3)$6H2O, Al(NO3)3$9H2O, Na3-citrate and NH4OH The effect of Al(NO3)$6H2O and
Na3-citrate, as surfactant chemicals, on the structural, morphological, optical and electrical properties of ZnO thinfilms were investigated X-ray diffraction results showed that all the deposited films were grown as a polycrystalline wurtzite hexagonal phase with a c-axis preferred, out-of-plane orientation and without unwanted second phase ZnO thin films deposited without any surfactant chemicals or deposited only with Al(NO3)$6H2O consist of elongated needle shaped nano-rods with a very rough surface morphology On the other hand, ZnO thin films prepared using Na3-citrate as a surfactant chemical consist of hexagonal nano-prisms with a very smooth surface morphology The thickness of the ZnO thin films with the very smooth surface morphology was increased remarkably using both
Na3-citrate and Al(NO3)$6H2O as surfactant chemicals, in which ZnO thinfilms consisted of elongated hexagonal nano-prisms These results show that relatively thick ZnO thinfilms with a good surface morphology can be grown easily by the appropriate use of surface modifying chemicals, such as
Na3-citrate and Al(NO3)$6H2O The photoluminescence results showed strong defect-related emission peak centered near 545 nm in the rough surfaced ZnO thinfilm grown without any surfactant chemicals and strong band-edge peak centered near 368 nm in the smooth surfaced ZnO thinfilm grown using both Na3-citrate and Al(NO3)$6H2O as the surfactant chemicals
Ó 2010 Elsevier B.V All rights reserved
1 Introduction
Zinc oxide (ZnO) is considered the most promising candidate for
a range of applications including room temperature ultraviolet
lasers transparent conducting electrodes, light emitting diodes,
sensors and surface-acoustic wave devices owing to its unique
binding energy (60 meV) and strong-chemical stability compared
scale ZnO crystals with various morphologies, such as
nano-rod, belt, wire and tubes are superior to those of the bulk-scale due
synthesized by several methods, such as metal organic chemical
hydro-thermal technique is one of the most attractive for industrial use
because industrial processes generally require rapid, low process costs, which are the main advantages of the hydrothermal
with a continuous, dense and smooth surface microstructure is
microstructure with varying process parameters
a hexagonal prism structure due to easily adjusting the surfactant
chemical species in the reaction solution, in which the surfactant
c-axis direction was poor, causing an increase in the growth processing time Therefore, it required a new approach to increase
* Corresponding author Tel.: þ82 62 530 1709; fax: þ82 62 530 1699.
E-mail address: jinhyeok@chonnam.ac.kr (J.H Kim).
Current Applied Physics
j o u r n a l h o me p a g e : w w w e l s e v i e r c o m/ l o ca t e / c a p
1567-1739/$ e see front matter Ó 2010 Elsevier B.V All rights reserved.
Trang 2the growth rate of ZnO crystal in the c-axis direction with keeping
hexagonal prism shape rather than needle likes shape
The purpose of this study is to grow dense and smooth ZnO thin
films with high growth rate We report that it is possible to grow
2 Experimental details
to control the shape of the ZnO crystals Four different solutions,
dissolved in 80 ml of DI water Solution C was formulated with
80 ml of DI water Solution D was formulated with 0.03 M of Zn
dis-solved in 80 ml of DI water 100 nm-thick ZnO seeded substrates,
which were deposited by RF magnetron sputtering at room
temperature, were cleaned sequentially in acetone and isopropyl
for 6 h The lid to the vessel was sealed to prevent evaporation At
the end of the period, the vessel was cooled to room temperature to
remove the specimens and the specimens were rinsed in DI water
The surface and cross-sectional morphologies of deposited thin
films were examined by field emission scanning electron
micros-copy (FE-SEM, JSM-6710F, JEOL, Tokyo, Japan) The crystallographic
Philips, and Eindhoven, Netherlands) The microstructure and
analyzed by transmission electron microscopy (TEM, JEM 2000EX,
JEOL, Tokyo, Japan) The optical properties of the deposited thin
films were determined by UVevis spectroscopy (Cary 100, Varian,
Mulgrave, Australia) at room temperature The photoluminescence
room temperature (RT) PL (APD, SH-4, USA) The electrical
3 Results and discussion
Fig 1shows XRD patterns of the ZnO thinfilms grown in
had a polycrystalline hexagonal wurtzite structure with a c-axis
preferred, out-of-plane orientation The samples grown in solutions
A and D showed a relatively strong (0002) peak intensity compared
to samples grown in solutions B and C The full width at half maximum (FWHM) values of the ZnO (0002) peak for the deposited
(0002) peak was observed in the sample grown in solution D, indicating the best c-axis preferred, out-of-plane orientation Fig 2(a,b,c,d) shows tilted-view FE-SEM images of ZnO thin films grown on the ZnO seeded glass substrates in solutions A, B, C and D, respectively The inset images show the corresponding
consisting of needle shaped nano-rods were observed in the
rough and discontinuous and the lengths of the ZnO nano-rods
(b,d)) A smooth and dense surface morphology was observed in those samples and the lengths of the ZnO nano-prisms were
Noticeable information was obtained from the aforementioned
contin-uous microstructure and reduced growth rate could be synthesized
surfactant chemical However, a dramatic decrease in the thickness
not observed in the sample grown in solution D, which contained
These characteristics were attributed to the surfactant ions It is well known that the oppositely charged ions produce positively charged Zn (0001) and negatively charged O (000l) surfaces, resulting in a normal dipole moment and spontaneous polarization
absor-bed on Zn-terminated (0001) planes of ZnO to slow down the
Table 1
Experimental conditions to prepare different solution of specimens.
Solution A Solution B Solution C Solution D
Fig 1 XRD patterns of the ZnO thin film grown on ZnO seeded glass substrate in different solutions at pH 10.3 for 6 h.
Trang 3growth rate in the [0001] direction Especially, the morphology of
(Fig 2(b,c)) However, the morphology of ZnO thinfilm grown in
solution D was high aspect ratio nano-prism with a smooth surface
as compared to these grown in solution B and C This phenomenon
the growth of ZnO crystals in the c-axis direction, which results in
the formation of hexagonal prism-shaped ZnO rods with a low
nano-prisms with a smooth surface
Fig 3shows a cross-sectional bright-field TEM image of the ZnO
selected area electron diffraction (SAED) pattern obtained at the
substrate were very sharp without any indication of an interfacial
reaction or any formation of amorphous compounds The SAED
normal direction with a slight out-of-plane variation This TEM
and 2 Fig 4shows a plot of (ahy)2as a function of the photon energy of
four different solutions The band gap energy was derived by
Fig 2 The tilted-view FE-SEM images of ZnO thin film grown on a ZnO seeded glass substrate in solutions A (a), B (b), C (c), and D (d), respectively.
Fig 3 The cross-sectional bright-field TEM image of the ZnO thin films grown on ZnO seeded glass substrates in solution D at pH 10.3 for 6 h.
Trang 4extrapolating the straight-line portion of the (ahy)2vs hyplot to
3.25 eV, 3.2 eV, 3.3 eV and 3.33 eV, respectively The abortion edges
Fig 5 shows the RT PL spectra of ZnO films grown in four
different solutions on the ZnO seeded glass substrates Two
attributed to recombination between electrons in the conduction
band and holes in the valence band and visible emission is related
shifted towards a lower wavelength compared to those grown in
Fig 6shows the electrical resistivity, carrier concentration and
grown in solution D compared to those grown in solution A was
chemicals These chemicals resulted in different morphology,
and 2) The Al(NO3)3$9H2O acted impurity of ZnO structure as well
films grown in solution D showed better crystallinity and
a smoother morphology than those grown in solution A with discontinuous morphology The surface morphology and
3.0 3.1 3.2 3.3 3.4 3.5
h υ ( eV)
Solution A Solution B Solution C Solution D
Fig 4 The plot of (ahy) 2 vs photon energy of the ZnO thin film grown on ZnO seeded
glass substrate in different solutions.
362 368 377
Wavelength (nm)
Solution C
Solution D
Solution A
Solution B
Fig 5 RT PL spectra of the ZnO thin film grown on ZnO seeded glass substrate in different solutions.
Solution D Solution A
2 4 6 8 10
-3 )
2 V
-1 s
Resistivity Carrier concentration Mobility
Fig 6 The electrical resistivity, carrier concentration and mobility of the ZnO thin film grown on ZnO seeded glass substrate in solutions A and D.
Trang 5electron trap centers, which reduce the charge carrier
concentra-tion and show a high intensity of deep-level emission results from
of characteristics In addition, the small grain size and empty space
reduces the mean free path of the free electron, leading to an
struc-ture, which released the free electron, resulted in the improved
4 Conclusion
showed improved photoluminescence and electrical properties
Acknowledgements
This work was supported partially by Energy R&D program
(2008-N-PV08-P-08) under the Korea Ministry of Knowledge
Economy (MKE) and partially by the National Research Foundation
of Korea (NRF) grant funded by the Korean government (MEST) (No 2010-0007691)
References
[1] C Klingshirn, Phys Status Solid B 71 (1975) 547.
[2] J.J Chen, F Zeng, D.M Li, J.B Niu, F Pan, Thin Solid Films 485 (2005) 257 [3] M Tadatsugu, Semicond Sci Technol 20 (2005) S35.
[4] T Gao, T.H Wang, J Appl Phys A 80 (2005) 1451.
[5] G.Q Ding, M.J Zheng, W.L Xu, W.Z Shen, Nanotechnol 16 (2005) 1285 [6] Y.G Chul, W Chunrui, P.W Ii, Semicond Sci Technol 20 (2005) S22 [7] Fan Zhiyong, L.G Jia, J Nanosci Nanotechnol 5 (2005) 1561.
[8] J Dai, H Liu, W Fang, L wang, Y Pu, Y Cen, F Jiang, J Cryst Growth 283 (2005) 93.
[9] R.P Wang, H Muto, Y Yamada, T Kusumori, Thin Solid Films 411 (2002) 69 [10] D Wang, C Song, J Phys Chem B 109 (2005) 12697.
[11] H Zhang, D Yang, S Li, X Ma, Y Ji, J Xu, D Que, Mater Lett 59 (2005) 1696 [12] L Vayssieres, K Keis, S.E Lindquist, A Harfeldt, J Phys Chem B 105 (2001) 3350.
[13] T.L Sounart, J Liu, J.A Voigt, J.W.P Hsu, E.D Spoerke, Z Tian, Y.B Jiang, Adv Funct Mater 16 (2006) 335.
[14] S Hirano, K Masuya, M Kuwabara, J Phys Chem B 108 (2004) 4576 [15] J.H Kim, D Andeen, F.F Lange, Adv Mater 18 (2006) 2453.
[16] C.H Ahn, D.K Seo, C.H Woo, H.K Cho, Phys B 404 (2009) 4835.
[17] S.H Cho, J.W Jang, S.H Jung, B.R Lee, E.G Oh, K.H Lee, Langmuir 25 (2009) 3825.
[18] J.A Kim, I.K Kim, T.W Kim, J.H Moon, J.H Kim, J Nanosci Nanotechnol 8 (2008) 5485.
[19] J.H Kim, E.M Kim, D Andeen, D Thomson, S.P Denbaars, F.F Lange, Adv Funct Mater 17 (2007) 463.
[20] F Wen, W Li, J.H Moon, J.H Kim, Solid State Commun 135 (2005) 34.