It was observed that the pure nanoparticle WO3 sensing layers began to react with nitrogen oxide at room temperature.. Keywords: Pure and indium-doped tungsten oxide thick film; WO3 gas
Trang 1Gas sensing properties of nanoparticle indium-doped WO 3 thick films
V Khatkoa,∗, E Llobeta, X Vilanovaa, J Brezmesa, J Hubalekb, K Malyszb, X Correiga
aDepartment d’ Enginyeria Electronica, Campus Sescelades, Universitat Rovira i Virgili, 43007 Tarragona, Spain
bDepartment ofMicroelectronics, Technical University ofBrno, 60200 Brno, Czech Republic
Available online 11 August 2005
Abstract
The gas sensing properties of pure and indium-doped nanoparticle WO3thick films were studied Sensors were prepared using commercial
WO3nanopowders and powder mixtures with different concentrations of In (1.5, 3.0 and 5.0 wt.%) The gas sensing properties of the sensors
to nitrogen dioxide, carbon monoxide, ammonia and ethanol were investigated It was observed that the pure nanoparticle WO3 sensing layers began to react with nitrogen oxide at room temperature These sensors had maximum sensitivity to NO2at 100◦C The indium-doped
WO3-based sensors were selective to NO2and CO at 200 and 300◦C, respectively A mechanism for such behaviour is discussed
© 2005 Elsevier B.V All rights reserved
Keywords: Pure and indium-doped tungsten oxide thick film; WO3 gas sensor; Gas sensing properties
1 Introduction
Nowadays, WO3-based thick films are considered as one
of the most interesting materials for detecting nitrogen oxides
and other species such as NH3, CH4and CO[1–6]
Reduc-ing the grain size of active layers is one of the key factors to
enhance the gas sensing properties of semiconductor metal
oxide sensors [7,8] Additionally, the inclusion of
differ-ent doping metals in the sensing films has been shown to
increase their sensitivity to specific gases In very recent
papers, the effects of doping either with In or indium oxide
on the response of tin oxide to hydrogen[9,10], methanol and
carbon monoxide[11]have been investigated An important
reduction in the operating temperature of the sensors for
opti-mal sensitivity to these species has been reported The aim
of this work is to study the sensing properties of nanoparticle
WO3gas sensors doped with In A mechanism of response
to NO2and CO will be presented and discussed
2 Experimental
Sensors were fabricated by screen-printing onto alumina
substrates A heating element and a temperature sensitive
∗Corresponding author Tel.: +34 977558653; fax: +34 977559605.
E-mail address: vkhatko@etse.urv.es (V Khatko).
meander on the backside substrate and interdigited gold elec-trodes on the front side of substrate were prepared by using commercial platinum (Heraeus C3657) and conductive (ESL 8884) pastes, according to the sensor fabrication procedures reported in[12] The commercial WO3nanopowder (Aldrich 55,008-6) with calculated spherical diameter up to 33.1 nm was mixed with InCl3using special technology to ensure: the breaking of In Cl bonds, the removal of Cl atoms and the uniform distribution of indium atoms in the tungsten oxide powder mixture Three powder mixtures with an In/W atom ratio equal to 1.5, 3.0 and 5.0 wt.% were prepared On the basis of the pure nanopowder and these powder mixtures, the gas sensing layers were deposited onto the electrodes using an organic binder Glass frit (4.9 wt.%) was used for the preparation of the sensing layers based on pure WO3 nanopowder, to ensure a good adhesion to the substrate After being deposited, the active layers were dried at 125◦C for
10 min and fired at 600◦C for 20 min.
The gas sensing properties of the sensors to nitrogen dioxide, carbon monoxide, ammonia and ethanol were inves-tigated The sensors were kept in a temperature and moisture controlled test chamber (40±1◦C and 41–43% R.H.) The
sensors were operated at ambient temperature, 100, 150, 200,
250, 300 and 350◦C to analyse the effect of the working
tem-perature on their response The resistance of the sensors in
the presence of either pure air (Rair) or the different pollutants
0925-4005/$ – see front matter © 2005 Elsevier B.V All rights reserved.
doi:10.1016/j.snb.2005.06.060
Trang 2measurements using a Siemens D5000 diffractometer
oper-ated at 40 kV and 30 mA with Cu K␣ radiation
3 Results and discussion
3.1 Gas sensitivity studies
For the first set of experiments, the sensing layers based
on pure tungsten oxide nanopowders were used The WO3
sensors were operated in a working temperature range from
room temperature to 350◦C The gas sensing properties of
the sensors to nitrogen dioxide and carbon monoxide were
investigated WO3sensors did not change resistance
signifi-cantly during their exposure to increasing CO concentrations
up to 500 ppm, throughout the temperature range studied
The sensor response of these sensors to nitrogen dioxide had
definite features.Fig 1shows the influence of the presence
of glass frit on the response of un-doped tungsten oxide
sen-sors to nitrogen dioxide It can be seen that the sensen-sors began
to react with gas at room temperature (Fig 1a) At 1 ppm
of NO2 the responsiveness calculated using the expression
S = (Rgas− Rair)/Rairis shown inTable 1as a function of the
sensor working temperature In the temperature range from
room temperature to 150◦C the sensors with glass frit (WO2
3) show a higher response to nitrogen dioxide than the sensors
without glass frit (WO13) (see Fig 1b and c) Furthermore,
the response of the former is much faster than the response
of the latter At working temperatures higher than 150◦C the
sensor resistance increases monotonously (Fig 1d) and the
sensitivity to nitrogen dioxide decreases
In a second set of experiments, the level of In doping
in the response of tungsten oxide based sensors to nitrogen
dioxide and carbon monoxide was investigated The sensors
were operated in a temperature range from 150 to 350◦C.
Figs 2 and 3show the effects of indium concentration in the
detection of nitrogen dioxide and carbon monoxide,
respec-Table 1
Responsiveness of pure nanopowder WO3 sensing layers to NO2 (1 ppm) as
a function of the working temperature and thick film composition
Thick film composition Working temperature
Room temperature 100 ( ◦C) 150 (◦C)
Super-indexes 1 and 2 are for tungsten oxide films without and with glass
frit, respectively.
Fig 1 Responses to nitrogen dioxide of pure WO3 sensors without (WO1) and with (WO2) glass frit in the paste, operated at room temperature (a),
100 ◦C (b), 150◦C (c) and 200◦C (d).
Trang 3Fig 2 Responses to nitrogen dioxide of indium-doped WO3 sensors with
indium concentrations of 1.5 wt.% (WIn1), 3.0 wt.% (WIn2) and 5.0 wt.%
(WIn3), operated at 150 ◦C (a) and 200◦C (b).
tively The In-doped WO3 sensors were more sensitive to
NO2 when operated at 200◦C and more sensitive to CO
when operated at 300◦C The sensors showed the highest
responsiveness to NO2when indium concentration was set at
3.0 wt.% When operated at 200◦C in the presence of 1 ppm
of NO2, the responsiveness of the In-doped tungsten oxide
sensors was 0.144, 0.347 and 0.188 for indium
concentra-tions of 1.5 wt.% (sensor labelled WIn1), 3.0 wt.% (WIn2)
and 5.0 wt.% (WIn3), respectively Fig 3 shows that only
the sensors (WIn3), i.e., doped with In at a level of 5 wt.%
responded to CO This responsiveness was up to 0.137
In a third set of experiments the response of the
differ-ent sensors to ethanol and ammonia was investigated The
working temperature range varied from 100 to 300◦C The
sensors showed response to ethanol at temperatures higher
than 200◦C.Fig 4shows the response sensor to ethanol as a
function of the concentration of indium in the sensing layers,
when operated at 300◦C It can be seen that a saturation effect
in sensor response takes place at 10 ppm of ethanol
Subse-quent injections of ethanol to increase its concentration to 100
Fig 3 Responses to carbon monoxide of indium-doped WO3 sensors with indium concentrations of 1.5 wt.% (WIn1 ), 3.0 wt.% (WIn2) and 5.0 wt.% (WIn3), operated at 250 ◦C (a) and 300◦C (b).
Fig 4 Responses to ethanol of indium-doped WO3 sensors with indium concentrations of 1.5 wt.% (WIn1 ), 3.0 wt.% (WIn2 ) and 5.0 wt.% (WIn3), operated at 300 ◦C.
Trang 4WIn1 , WIn2 and WIn3 correspond to indium doping levels of 1.5, 3 and
5 wt.%, respectively.
and 500 ppm did not essentially change the resistance of the
sensing layers The responsiveness of the differently doped
sensors to ethanol as a function of their working temperature
is shown inTable 2 The sensors with an indium concentration
of 5.0 wt.% showed the highest responsiveness when
oper-ated at 250◦C The sensor response to ammonia follows an
involved pattern (seeFig 5) The resistance of the different
sensing layers increased when 10 or 100 ppm of ammonia
were injected into the test chamber, and decreased sharply
when ammonia concentration was increased to 500 ppm
3.2 Structural characterisation
SEM and XRD investigations were used to explain the
experimental results obtained Fig 6 shows the surface
(Fig 6a) and the morphology of the pure WO3 thick film
(Fig 6b) and In doped (5 wt.%) WO3 thick film (Fig 6c)
sensing layers It can be seen that the film surface (Fig 6a)
shows a large quantity of cracks It is assumed that crack
for-mation is related to the high (up to 80◦C/min) temperature
increase rate at the initial stage of firing The average
gran-ule size in the pure WO3 sensing layers was up to 60 nm
(Fig 6b) The morphology of the In doped sensing layer
did not depend on indium concentration The tungsten oxide
layers were nanoparticular with average granule size around
Fig 5 Responses to ammonia of indium-doped WO3 sensors with indium
concentrations of 1.5 wt.% (WIn1), 3.0 wt.% (WIn2) and 5.0 wt.% (WIn3),
operated at 300 ◦C.
Fig 6 SEM images of a pure WO 1 thick film surface (a, b) and indium-doped WO3 thick film with indium concentration of 3 wt.%
70 nm and had uniform granule distribution (Fig 6c) It can
be seen that the morphology of the pure and In doped WO3 sensing layers is almost identical There is just a small dif-ference in the average granule size
XRD data showed that two monoclinic phases (JCPDS cards no 83-0950 and 87-2386) are present in the com-mercial WO3 nanopowders Two monoclinic phases are
described in the P21/n (JCPDS cards no 83-0950) and
Pc (JCPDS cards no 87-2386) space with cell
Trang 5param-Fig 7 XRD patterns from WO3 nanopowders, and pure (WO 1 ) and
indium-doped WO3 thick films (WIn2 and WIn3).
eters a = 7.3008, b = 7.5389, c = 7.6896, β = 90.892◦ and
a = 5.2771, b = 5.1569, c = 7.666, β = 91.742◦, respectively.
Fig 7 presents the XRD patterns from 2θ = 22◦ to 25◦ of
WO3nanopowder, both pure and In-doped WO3thick films
The XRD patterns contain (2 0 0), (0 2 0) and (0 0 2)
reflec-tions of the monoclinic phase described in the P21/n space
and (1 1 0) reflection of another monoclinic phase After the
firing process, the sensing layers had mainly the first
mon-oclinic phase described in the P21/n space The presence of
metallic indium and indium oxide phase was not detected by
the XRD method On the basis of this result, we can suggest
that In3+ ions were able to diffuse into the tungsten oxide
lattice at the firing temperature used This fact is confirmed
indirectly The basic X-ray lines in the X-ray spectrum show
a shift from the standard position that increases when the
con-centration of indium is increased (seeFig 7) The crystallite
size in the WO3nanopowder, and in pure and In-doped WO3
thick films was evaluated from the diffraction line of (0 0 2)
Table 3 Chemical element distribution in the indium-doped WO3 thick films Indium concentration in
WO3 thick films (wt.%)
Chemical elements
based on the Scherrer equation[13]
D h k l= 0.9λ
β h k l cos(θ h k l) (1) whereλ is wavelength of the incident radiation, β h k lthe full width at half-maximum (FWHM) of the peak in the radiation, andθ h k lthe Bragg angle The average crystallite size of WO3 nanopowder and pure WO3thick film is 30.4 and 45.5 nm, respectively In In-doped WO3 thick films this parameter
is 49.0 nm (1.5 wt.% In), 43.6 nm (3 wt.% In) and 43.0 nm (5 wt.% In)
An analysis of the chemical element distribution in the sensing layers obtained by energy-dispersive X-ray spec-troscopy (EDX) confirmed the absence of chlorine atoms into the sensing layers.Fig 8 shows the chemical element distribution into the In-WO3sensors with an indium concen-tration up to 3 wt.% obtained by EDX It can be seen that tungsten, indium and oxygen atoms are the only constituents
of the sensing layer Estimation of the In/W ratio in the tung-sten oxide films doped with indium performed on the basis of EDX data were in good agreement with the designed indium concentrations of 1.5, 3 and 5 wt.% These results are sum-marised inTable 3
3.3 Discussion
The data obtained from the first set of experiments show that the high response of pure WO3sensing layers (even at
Fig 8 Chemical element distribution in the indium-doped WO3 sensor with indium concentration of 3 wt.%
Trang 6pure tungsten oxide films at 100 C is the desorption of O2
[14]species NO2replaces the desorbed oxygen species at the
surface of the WO3thick films, which causes a sharp growth
in their resistance Increasing the working temperature of the
sensors changes the equilibrium of the adsorption–desorption
reaction with NO2 The decrease in the number of active
adsorption sites when the temperature of the sensor is raised
causes a reduction of the sensor response to NO2 at
work-ing temperatures higher than 100◦C The addition of glass
frit increases sensor sensitivity because of the presence of
different metal oxide additives
The firing process undergone by pure or In-doped tungsten
oxide films at 600◦C does not dramatically increases particle
size nor promotes the growth of crystallites Furthermore,
particle size of pure or In-doped films is almost identical due
to the fact that indium diffuses into the tungsten oxide lattice
The sensitivity of indium-doped sensors operated at 200
and 300◦C to NO
2 and CO is determined by the defects generated by the inclusion of indium impurities During the
preparation of powder mixtures and the firing process, In3+
ions generated from the breaking of In Cl bonds can diffuse
into the tungsten oxide lattice and form there an additional
number of new defects On the basis of XRD data it can
be derived that these defects are substitutional defects, since
the interplanar spacing of the WO3crystal lattice decreases
when the concentration of indium impurities is increased
Correspondingly, new energetic levels related to the presence
of indium atoms are generated in the band gap of the
In-loaded WO3 These energetic levels are the source of added
support of charge that changes the sensing properties of the
WO3-based sensors
4 Conclusions
The gas sensing properties of pure and indium-doped
nanoparticle WO3 thick films were studied Sensors were
prepared using commercial WO3 nanopowders and
pow-der mixtures with different concentrations of In (1.5, 3.0
and 5.0 wt.%) Their response to different concentrations of
nitrogen dioxide, carbon monoxide, ammonia and ethanol
were investigated It was found that the pure WO3 sensors
responded to nitrogen dioxide even when operated at room
temperature These sensors showed a maximum sensitivity
to NO2 when working at 100◦C The fact that pure WO
3 sensing layers show response to NO2at low temperatures is
due to the small grain size and high surface area of the WO3
nanopowders Indium-doped WO sensors were selective to
for performing the XRD measurements on the WO3 thick films
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Biographies
Viacheslav Khatko graduated in nuclear physics from the Byelorussian
State University (Minsk, Belarus) in 1971 He received his PhD in mate-rial science in 1985 and Dr.Sc in electronic engineering in 2001 In 1975–2003 he worked at the Physical Technical Institute of National Academy of Sciences of Belarus, Minsk, as a researcher, head of the
Trang 7Laboratory of Electronic Engineering Materials, head of the Thin Film
Materials Department and then as Principal Investigator of the
insti-tute He was Ford SABIT Intern and Ford Visiting Scientist in 1998
and 1999, respectively From April 2003 he is Ram´on y Cajal
profes-sor in the Electronic Engineering Department at the Universitat Rovira
i Virgili (Tarragona, Spain) His current research interests include the
development and application of semiconductor thin and thick film gas
sensors.
Eduard Llobet graduated in telecommunication engineering from the
Universitat Polit`ecnica de Catalunya (UPC), (Barcelona, Spain) in 1991,
and received his PhD in 1997 from the same university During 1998,
he was a visiting fellow at the School of Engineering, University of
Warwick (UK) He is currently an associate professor in the Electronic
Engineering Department at the Universitat Rovira i Virgili (Tarragona,
Spain) His main areas of interest are in the fabrication, and modelling,
of semiconductor chemical sensors and in the application of intelligent
systems to complex odour analysis Dr Llobet is a member of the Institute
of Electrical and Electronic Engineers.
Xavier Vilanova graduated in telecommunication engineering from the
Universitat Polit`ecnica de Catalunya (UPC), (Barcelona, Spain) in 1991,
and received his PhD in 1998 from the same university He is currently
an associate professor in the Electronic Engineering Department at the
Universitat Rovira i Virgili (Tarragona, Spain) His main areas of interest
are in semiconductor chemical sensors modelling and simulation.
Jes ´us Brezmes graduated in telecommunication engineering from the
Universitat Polit`ecnica de Catalunya (UPC), (Barcelona, Spain) in 1993.
Since 1993, he has been a Ph.D student in the Signal Processing and
Communications Department at the same university He has been a lec-turer in the Electronic Engineering Department at the Universitat Rovira
i Virgili (Tarragona, Spain) since 1994 His main area of interest is in the application of signal processing techniques such as neural networks
to chemical sensor arrays for complex aroma analysis.
Jaromir Hubalek graduated in electronic devices and systems from Brno
University of Technology (Czech Republic) in 1996 Since 1996 he has been a PhD student at the Microelectronics Department at Brno University
of Technology and received his PhD in 2003 from the same university His work is focused on precise conductivity detector using planar comb electrodes Since 2000 he has worked in thick-film sensors fabrication at the Electronic Engineering Department at the Universitat Rovira i Virgili (Tarragona, Spain).
Karel Malysz graduated in Materials Engineering at University of
Par-dubice, faculty of Chemistry and Chemical Technology in 2000 Since
2000 he has been a PhD student at the Department of Microelectronics, Brno University of Technology (Brno, Czech republic) His work focuses
on the preparation of new types of semiconductor gas sensors and gas sensing materials.
Xavier Correig graduated in telecommunication engineering from the
Universitat Polit`ecnica de Catalunya (UPC), (Barcelona, Spain) in 1984, and received his PhD in 1988 from the same university He is a full professor of Electronic Technology in the Electronic Engineering Depart-ment at the Universitat Rovira i Virgili (Tarragona, Spain) His research interests include heterojunction semiconductor devices and solid-state gas sensors Dr Correig is a member of the Institute of Electrical and Elec-tronic Engineers.